Carbon Nitride Films Deposited on 〈111〉 Si Substrates by Reactive Excimer Laser Ablation
Emilia D'Anna,M. De Giorgi,Gilberto Leggieri,Armando Luches,Maurizio Martino,Alessio Perrone,A. Zocco +6 more
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TL;DR: In this paper, XRD and TEM analyses point to an oriented microcrystalline structure of the films deposited at relatively high laser fluences (12 to 16 J/cm2) due to the high kinetic energy of the radicals in the laser produced plasma plume.
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Abstract: We deposited CNx films on 〈111〉 Si substrates at room temperature by XeCl laser ablation of graphite targets in low pressure N2 atmosphere at laser fluences in the range of 3 to 16 J/cm2. Different diagnostic techniques (SEM, TEM, RBS, XPS, XRD) were used to characterize the deposited films. Films are plane and adhesive to their substrates. The deposition rates depend on laser fluence, ambient pressure and target to substrate distance. The nitrogen concentration increases with increasing ambient pressure and laser fluence. N/C atomic ratios up to 0.7 were inferred from RBS measurements in films deposited at a fluence of 16 J/cm2. XRD and TEM analyses point to an oriented microcrystalline structure of the films deposited at relatively high laser fluences (12 to 16 J/cm2). This could be due to the high kinetic energy of the radicals in the laser produced plasma plume.
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Citations
On the validity of the formation of crystalline carbon nitrides, C3N4
S. Matsumoto,Erqing Xie,F. Izumi +2 more
TL;DR: X-ray powder diffraction patterns were simulated for five structures proposed for C3N4, i.e., β-, α-, defect zincblend-type and cubic C 3N4 as discussed by the authors.
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Structural Analysis of a Carbon Nitride Film Prepared by Ion-Beam-Assisted Deposition
Toshiyuki Hayashi,Akihito Matsumuro,Mutsuo Muramatsu,Masao Kohzaki,Yutaka Takahashi,Katsumi Yamaguchi +5 more
TL;DR: In this article, the microstructure of a carbon nitride (CNx) film formed by ion-beam-assisted deposition (IBAD) was investigated by transmission electron microscopy (TEM).
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Thin Nitride Films Deposited by Reactive Pulsed Laser Ablation
Armando Luches,Anna Paola Caricato +1 more
- 01 Jan 2003
TL;DR: In this article, a review of the work done in our laboratory and others on synthesis and deposition of thin films of metal nitrides using the reactive pulsed laser ablation (RPLD) technique is presented.
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Carbon nitride films deposited by very high-fluence XeCl excimer-laser reactive ablation
S. Acquaviva,Emilia D'Anna,M. De Giorgi,M. Fernandez,Gilberto Leggieri,Armando Luches,A. Zocco,Guiseppe Majni +7 more
TL;DR: In this article, the characteristics of CN x films deposited by excimer laser ablation of graphite targets in low pressure N 2 atmosphere were reported, where a XeCl laser (A = 308 nm, τ FWHM = 30 ns) at the fluence of 32 J/cm 2 and repetition rate of 10 Hz was used.
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