Patent
Alignment Mark Deformation Estimating Method, Substrate Position Predicting Method, Alignment System and Lithographic Apparatus
Wei Xiuhong,Bijnen Franciscus Godefridus Casper,Richard Johannes Franciscus Van Haren,Marcus Adrianus Van De Kerkhof,Everhardus Cornelis Mos,Hubertus Johannes Gertrudus Simons,Edart Remi Daniel Marie,David Deckers,Nicole Schoumans,Irina Lyulina +9 more
- 02 Nov 2012
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TL;DR: In this paper, the alignment sensor system is able to emit light at different measuring frequencies to reflect from an alignment mark on the substrate and to detect a diffraction pattern in the reflected light in order to measure an alignment position of the alignment mark.
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Abstract: A method is used to estimate a value representative for a level of alignment mark deformation on a processed substrate using an alignment system. The alignment sensor system is able to emit light at different measuring frequencies to reflect from an alignment mark on the substrate and to detect a diffraction pattern in the reflected light in order to measure an alignment position of the alignment mark. The two or more measuring frequencies are used to measure an alignment position deviation per alignment mark associated with each of the two or more measuring frequencies relative to an expected predetermined alignment position of the alignment mark. A value is determined representative for the spread in the determined alignment position deviations per alignment mark in order to estimate the level of alignment mark deformation.
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Citations
Patent
Inspection method, template substrate, and focus offset method
Hideo Tsuchiya,Ogawa Riki +1 more
- 13 May 2015
TL;DR: In this article, a substrate to be inspected includes a first pattern constructed with a repetitive pattern that is not resolved by a wavelength of a light source, and at least one alignment mark that is arranged on the same plane as the first pattern.
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Method of controlling a lithographic apparatus and device manufacturing method, control system for a lithographic apparatus and lithographic apparatus
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- 15 Sep 2016
TL;DR: In this article, historical performance measurements are used to calculate a process model relating to a lithographic process and the model mapping is applied to modify the substrate model to improve overlay performance.
3
Patent
Mark Position Determination Method
Simon Gijsbert Josephus Mathijssen,Goosen Maikel Robert +1 more
- 14 Feb 2017
TL;DR: In this paper, a method of determining positions of marks on a substrate, the marks comprising structures arranged periodically in at least a first direction, at least some of the structures comprising periodic sub-structures, the substructures having a smaller period than the structures, the positional offsets being caused by a combination of both known and unknown components, was proposed.
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TL;DR: In this paper, a template substrate for adjusting a focus offset to detect a defect using an optical image obtained by irradiating a substrate with light emitted from a light source is presented.
1
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Method of exposing a semiconductor structure, apparatus for controlling a lithography process performed by a lithography apparatus across a semiconductor structure, non-transitory computer readable medium having instructions stored thereon for generating a weight function
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- 09 Apr 2020
TL;DR: In this article, the model functions may be combined to determine a combined model function by using a weight function that assigns a different weight to each of basis functions of the model function.
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Patent
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Patent
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60
Patent
Method and apparatus for orienting semiconductor wafers in semiconductor fabrication
Jens Stäcker
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TL;DR: In this paper, a method for orienting a semiconductor wafer during semiconductor fabrication with the aid of an optical alignment system is described, which is optimized for position determination.
11
Patent
Position detection apparatus, position detection method, exposure apparatus, and device fabrication method
Takahiro Matsumoto,Koichi Sentoku,Satoru Oishi +2 more
- 26 Mar 2009
TL;DR: In this article, a position detection system for a plurality of light beams, having different wavelength with each other, of the light having the wavelength width, is presented, where a first obtaining unit is configured to obtain imaging characteristics of an imaging optical system.
9
Patent
Lithographic apparatus, method of determining a model parameter, device manufacturing method, and device manufactured thereby
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TL;DR: In this paper, a method for determining at least one parameter of a model that provides information about a position of an object is proposed. But the method is not suitable for the case of a single object.
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