1. What contributions have the authors mentioned in the paper "A new graph-theoretic, multi-objective layout decomposition framework for double patterning lithography" ?
In this paper, the authors propose a multi-objective min-cut based decomposition framework for stitch minimization, balanced density, and overlay compensation, simultaneously.. The key challenge of DPL is to accomplish high quality decomposition for large-scale layouts under reasonable runtime with the following objectives: a ) the number of stitches is minimized, b ) the balance between two decomposed layers is maximized for further enhanced patterning, c ) the impact of overlay on coupling capacitance is reduced for less timing variation.. Experimental results show that the proposed framework is highly scalable and fast: the authors can decompose all 15 benchmark circuits in five minutes in a density balanced fashion, while an ILP-based approach can finish only the smallest five circuits.. In addition, the authors can remove more than 95 % of the timing variation induced by overlay for tested structures.
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2. What are the future works mentioned in the paper "A new graph-theoretic, multi-objective layout decomposition framework for double patterning lithography" ?
Since the decomposition framework is flexible to add constraints, the authors extend their work to timing driven decomposition which reduces the timing variation due to overlay.. As a future work, the authors can extend the framework for correlation aware decomposition and multiple decomposition using a multiway partitioning algorithm.
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