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  4. 1975
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  3. Thin Solid Films
  4. 1975
Showing papers in "Thin Solid Films in 1975"
Journal Article•10.1016/0040-6090(75)90057-7•
Implanted noble gas atoms as diffusion markers in silicide formation

[...]

Wei-Kan Chu1, S. S. Lau1, James W. Mayer1, H. Müller1, King-Ning Tu2 •
California Institute of Technology1, Hodges University2
01 Feb 1975-Thin Solid Films
TL;DR: In this article, the displacement of noble gas atoms of Ar and Xe has been used as diffusion markers in growth studies of silicides formed by reacting metal films with silicon substrates, and two approaches were used: either the silicon samples were implanted with Xe or Ar and then covered with a thin layer of metal or the metal layer was implanted with the marker.

266 citations

Journal Article•10.1016/0040-6090(75)90056-5•
Special aspects of diffusion in thin films

[...]

R. W. Balluffi1, J.M. Bkakely1•
Cornell University1
01 Feb 1975-Thin Solid Films
TL;DR: In this article, the authors identify and describe a number of factors which may cause diffusion in thin films to differ from the ordinary diffusion which occurs in bulk specimens at elevated temperatures, and discuss these factors in turn, with reference to experiment wherever possible.

209 citations

Journal Article•10.1016/0040-6090(75)90059-0•
Iron silicide thin film formation at low temperatures

[...]

S. S. Lau1, J.S.-Y. Feng1, J. O. Olowolafe1, M.-A. Nicolet1•
California Institute of Technology1
01 Feb 1975-Thin Solid Films
TL;DR: The rate kinetics of the formation of compound phases from thin layers of 1000-1500 A α-Fe deposited onto single-crystal Si have been studied by MeV 4He+ backscattering spectrometry as mentioned in this paper.

112 citations

Journal Article•10.1016/0040-6090(75)90251-5•
Radiation effects on solid state diffusion

[...]

Y. Adda, M. Beyeler, G. Brebec
01 Jan 1975-Thin Solid Films
TL;DR: In this paper, the authors present the methods for describing the evolution of irradiation defects as a function of temperature, defect rate production, sink density etc and discuss the equations which allow the diffusion coefficient under irradiation to be calculated.

104 citations

Journal Article•10.1016/0040-6090(75)90053-X•
Activation energy for electrotransport in thin silver and gold films

[...]

Rolf E. Hummel1, H.J. Geier1•
University of Florida1
01 Feb 1975-Thin Solid Films
TL;DR: In this paper, the activation energy Δ H for electrotransport in thin silver and gold films was measured by a resistometric technique involving several individual resistance measurements along a stripe, and the temperature of the center of the films was held constant during the entire experiment using a thin film thermocouple.

97 citations

Journal Article•10.1016/0040-6090(75)90041-3•
Preparation and properties of reactively co-sputtered transparent conducting films

[...]

H.W. Lehmann, R. Widmer
01 Jun 1975-Thin Solid Films
TL;DR: In this article, the method of reactive co-sputtering was used to determine the optimum dopant concentration for low resistivity In 2 O 3 /SnO 2 and SnO 2 /Sb 2 O 5 films.

94 citations

Journal Article•10.1016/0040-6090(75)90240-0•
Linear response theory of the driving forces for electromigration

[...]

Pradeep Kumar1, R.S. Sorbello1•
University of Wisconsin–Milwaukee1
01 Jan 1975-Thin Solid Films
TL;DR: Using linear response theory, the authors obtained a response function for the force exerted on an impurity in the presence of an electric field, which measures the total force including both the local screening of the applied field and the dynamic polarization due to the electron-drag effect.

94 citations

Journal Article•10.1016/0040-6090(75)90249-7•
Surface self-diffusion of single atoms☆

[...]

William R. Graham1, Gert Ehrlich1•
University of Illinois at Urbana–Champaign1
01 Jan 1975-Thin Solid Films
TL;DR: The surface transport of atoms plays an important role in the growth of crystals from the vapor as mentioned in this paper, and using the field ion microscope it has been possible to establish quantitatively the diffusion parameters for rhodium atoms on different planes of their own crystal, as well as for Tungsten atoms on tungsten.

80 citations

Journal Article•10.1016/0040-6090(75)90106-6•
Dielectric behaviour of dysprosium oxide films

[...]

A. Goswami1, R. Ramesh Varma1•
National Chemical Laboratory1
01 Aug 1975-Thin Solid Films
TL;DR: In this paper, the dielectric properties of vacuum-deposited dysprosium oxide films have been studied in the audio-frequency range (102-104 Hz) at various temperatures (78-373 K).

77 citations

Journal Article•10.1016/0040-6090(75)90273-4•
The early stages of condensation of lead on tungsten

[...]

Ernst Bauer1, Helmut Poppa1, G. Todd1•
Ames Research Center1
01 Jul 1975-Thin Solid Films
TL;DR: In this paper, the growth of the first few layers of Pb on W {110} and W {100} single-crystal surfaces has been studied by AES, LEED, work function measurements and thermal desorption spectroscopy in one combined experimental system also equipped with a quartz oscillator for absolute thickness determinations.

68 citations

Journal Article•10.1016/0040-6090(75)90047-4•
Effect of driving forces on atom motion

[...]

H.B. Huntington1•
Rensselaer Polytechnic Institute1
01 Feb 1975-Thin Solid Films
TL;DR: In this paper, the influence of the thermal gradient (thermomigration) and of electric current (electromigration) on atom motions in the solid phase are treated. But only the influences of thermal gradient and electric current are considered.
Journal Article•10.1016/0040-6090(75)90244-8•
Diffusion correlation in random alloys

[...]

H. J. de Bruin1, Graeme E. Murch1, H. Bakker2, L. P. Van Der Mey2•
Flinders University1, University of Amsterdam2
01 Jan 1975-Thin Solid Films
TL;DR: In this paper, a Monte Carlo simulation of the solid state diffusion process in random binary alloys has been performed on a computer array of A and B atoms, coded in the relevant cubic symmetry.
Journal Article•10.1016/0040-6090(75)90100-5•
The optical properties of thin films of tantalum pentoxide and zirconium dioxide

[...]

E. E. Khawaja1, S G Tomlin1•
University of Adelaide1
01 Dec 1975-Thin Solid Films
TL;DR: In this article, the indices of refraction and absorption of thin films of tantalum pentoxide and zirconium dioxide have been determined in the wavelength range 250-2000 nm.
Journal Article•10.1016/0040-6090(75)90250-3•
Atomic view of surface diffusion with and without a driving force, and atomic interactions

[...]

Tien T. Tsong1, Paul Cowan1, Gary Kellogg1•
Pennsylvania State University1
01 Jan 1975-Thin Solid Films
TL;DR: In this article, a very high non-uniform electric field is applied to a surface, polarization binding induces a driving force and adatom migration becomes directional, which can be used to obtain information on diffusion parameters, interatomic potentials and some other elementary properties of adatoms.
Journal Article•10.1016/0040-6090(75)90275-8•
Comparative study of Si(111), silicon oxide, SiC and Si3N4 surfaces by secondary ion mass spectroscopy (SIMS)

[...]

Alfred Benninghoven1, W. Sichtermann1, S. Storp1•
University of Münster1
01 Jul 1975-Thin Solid Films
TL;DR: In this paper, a single focusing magnetic sector-field mass spectrometer was used to investigate the secondary ion emissions of clean silicon, oxygen-covered silicon, silicon oxide, silicon carbide and silicon nitride.
Journal Article•10.1016/0040-6090(75)90164-9•
The nucleation and initial growth of gold films deposited onto sodium chloride by ion-beam sputtering

[...]

G.E. Lane1, J.C. Anderson1•
Imperial College London1
01 Mar 1975-Thin Solid Films
TL;DR: In this article, the initial growth of sputtered films of gold on vacuum-cleaved rocksalt substrates was studied. But the results were not compared with the results for evaporation.
Journal Article•10.1016/0040-6090(75)90136-4•
Electrical conduction in thin polymer fluorocarbon films

[...]

W. Vollmann, H.-U. Poll
01 Apr 1975-Thin Solid Films
TL;DR: In this article, the currentvoltage characteristics of thin polymer fluorocarbon films with thicknesses between 0.02 and 1.50 μm, deposited by different methods and with different contact materials, have been studied.
Journal Article•10.1016/0040-6090(75)90199-6•
Electroluminescence spectra from gold island structure thin films

[...]

M. Bischoff1, H. Pagnia1•
Darmstadt University of Applied Sciences1
01 Oct 1975-Thin Solid Films
TL;DR: In this article, spot-like electroluminescence (EL) spectra and their dependence on bias voltage V have been measured for Au island structures on various substrates (quartz glass, Si, GaP, CdS).
Journal Article•10.1016/0040-6090(75)90255-2•
Atomic model for grain boundary and surface diffusion

[...]

P. Benoist, Georges Martin
01 Jan 1975-Thin Solid Films
TL;DR: In this article, the authors show that the diffusion formalism is appropriate only within the limit of infinite bulk penetration distances, and for impurity diffusion the grain boundary is in equilibrium with the surrounding bulk phase.
Journal Article•10.1016/0040-6090(75)90298-9•
Refractive index and packing density for MgF2 films: Correlation of temperature dependence with water sorption

[...]

S. Ogura1, N. Sugawara1, R. Hiraga1•
Canon Inc.1
01 Nov 1975-Thin Solid Films
TL;DR: A deeper understanding of water-sorption phenomena in MgF 2 films has been acquired by investigation of the substrate temperature dependence of the packing densities and the dynamic change in water sorption in the pores of the films through various subsequent treatments as mentioned in this paper.
Journal Article•10.1016/0040-6090(75)90276-X•
Resistivity and Hall effect of copper films before and after adsorption of carbon monoxide

[...]

G. Wedler1, W. Wiebauer1•
University of Erlangen-Nuremberg1
01 Jul 1975-Thin Solid Films
TL;DR: In this paper, the dependence of the resistivity and the Hall effect of copper films on the method of film preparation and the film thickness has been studied before and after adsorption of carbon monoxide.
Journal Article•10.1016/0040-6090(75)90211-4•
The electrical properties of silicon monoxide

[...]

M.S. Frost1, Andrew K. Jonscher1•
University of London1
01 Sep 1975-Thin Solid Films
TL;DR: In this article, the authors measured the d.c and a.c. properties of two samples of evaporated silicon monoxide sandwiched between aluminium electrodes and concluded that the a.C. mechanism is such that the real and the imaginary components of the complex dielectric susceptibility are proportional to one another regardless of frequency.
Journal Article•10.1016/0040-6090(75)90061-9•
Determination of concentration profile in thin metallic films: Applications and limitations of He+ backscattering☆

[...]

S.U. Campisano, Gaetano Foti, F. Grasso, Emanuele Rimini
01 Feb 1975-Thin Solid Films
TL;DR: In this article, the activation energy and diffusion coefficient of Cu dissolved in Au thin films have been measured and the Matano surface for interdiffusing Au and Cu has been determined.
Journal Article•10.1016/0040-6090(75)90221-7•
Misfit dislocation sources in epitaxial films part I: Growth of Pd on (001) Au substrates

[...]

D. Cherns, M.J. Stowell
01 Sep 1975-Thin Solid Films
TL;DR: The epitaxial growth of Pd films on (001) Au substrates has been studied in situ in the transmission electron microscope and new misfit dislocation sources have been found as discussed by the authors.
Journal Article•10.1016/0040-6090(75)90167-4•
Electrical conduction mechanism in solution grown thin polyvinylchloride (PVC) films

[...]

Alok C. Rastogi1, K. L. Chopra1•
Indian Institute of Technology Delhi1
01 Mar 1975-Thin Solid Films
TL;DR: In this paper, the electrical transport behavior of thin polyvinylchloride (PVC) films deposited by the solution growth technique has been investigated, and the current transport in PVC films of 2500 A thickness at temperatures below 250 K is ascribed to hopping mechanisms.
Journal Article•10.1016/0040-6090(75)90187-X•
A comparison of r.f. sputtered and plasma polymerized thin films of tetrafluoroethylene

[...]

J. M. Tibbitt1, M. Shen1, Alexis T. Bell1•
University of California, Berkeley1
01 Oct 1975-Thin Solid Films
Journal Article•10.1016/0040-6090(75)90027-9•
Photoconduction in Langmuir films with periodically arranged dye-sensitizers

[...]

Michio Sugi1, Keiko Nembach1, Dietmar Möbius1•
Max Planck Society1
01 Jun 1975-Thin Solid Films
TL;DR: In this paper, the authors investigated high field photoconduction in dye-sensitized Langmuir films and found that the higher temperature mode is associated with an activation energy which is 0.35 eV larger than that for the lower temperature mode.
Journal Article•10.1016/0040-6090(75)90026-7•
Substrate treatment and film deposition in ionized and activated gas

[...]

L. Holland1•
University of Sussex1
01 Jun 1975-Thin Solid Films
TL;DR: In this article, the deposition conditions in ion plating and the reactive evaporation of metal oxides using ionized gas are discussed, and the preparation of boundary lubricant coatings on metal and dielectric bearings after plasma cleaning is discussed as a typical example.
Journal Article•10.1016/0040-6090(75)90259-X•
On the direct measurement of diffusion at temperatures less than 0.5 Tm

[...]

D. Gupta1•
IBM1
01 Jan 1975-Thin Solid Films
TL;DR: The important microsectioning techniques developed in the last decade for the direct measurement if diffusion at low temperatures (T m ) are briefly reviewed and critically discussed in this article, where the relative merits of the various techniques described are discussed by examining the quality of the recently available low temperature diffusion data for Au.
Journal Article•10.1016/0040-6090(75)90051-6•
Mass transport during electromigration in aluminum-magnesium thin films☆

[...]

A. Gangulee1, François M. d'Heurle1•
IBM1
01 Feb 1975-Thin Solid Films
TL;DR: In this paper, single-crystal and polycrystalline aluminum thin film conductors, containing up to 6 at.% magnesium, were subjected to electromigration experiments at 175° and 225°C with current densities up to 4 × 106 A/cm2 and for times up to 50 000 h.
...

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