About: Microlithography World is an academic journal. The journal publishes majorly in the area(s): Reticle & Node (networking). It has an ISSN identifier of 1074-407X. Over the lifetime, 2 publications have been published receiving 6 citations.
TL;DR: The resist image quality produced by step-and-scan exposure tools depends upon the performance of the synchronized wafer and reticle stages as much as on the quality of the optics.
Abstract: The resist image quality produced by step-and-scan exposure tools depends upon the performance of the synchronized wafer and reticle stages as much as on the quality of the optics. Achieving high throughput and sub-quarter micron resolution requires careful stage engineering.