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  4. 2000
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  3. Materials Science in Semiconductor Processing
  4. 2000
Showing papers in "Materials Science in Semiconductor Processing in 2000"
Journal Article•10.1016/S1369-8001(00)00037-8•
Intrinsic defects in silicon

[...]

George D. Watkins1•
Lehigh University1
01 Aug 2000-Materials Science in Semiconductor Processing
TL;DR: A review of what has been learned from electron paramagnetic resonance (EPR) and localized vibrational mode (LVM) spectroscopy concerning isolated lattice vacancies and self-interstitials, and their interactions with other defects in silicon is given in this article.

226 citations

Journal Article•10.1016/S1369-8001(00)00015-9•
A temperature dependent model for the saturation velocity in semiconductor materials

[...]

Rudiger Quay1, C Moglestue1, Vassil Palankovski, Siegfried Selberherr•
Fraunhofer Society1
01 Mar 2000-Materials Science in Semiconductor Processing
TL;DR: In this article, the authors present a model implementing the temperature dependence of the saturation velocity vsat into the two-dimensional device simulator MINIMOS-NT, which covers all relevant materials such as the elementary semiconductors Si and Ge, and the binary III-V group semiconductorors GaAs, AlAs, InAs, GaP and InP.

135 citations

Journal Article•10.1016/S1369-8001(00)00022-6•
Comparison of 3C–SiC, 6H–SiC and 4H–SiC MESFETs performances

[...]

C. Codreanu, Marioara Avram, E. Carbunescu1, E. Iliescu•
University of Bucharest1
01 Mar 2000-Materials Science in Semiconductor Processing
TL;DR: In this paper, a comparative analysis of the main DC and microwave performances of MESFETs made of the commercially available silicon carbide polytypes 3C-SiC, 6H−SiC and 4H−SciC is presented.

66 citations

Journal Article•10.1016/S1369-8001(00)00052-4•
Integrated optics based on organo-mineral materials

[...]

Paul Coudray1, Pascal Etienne1, Yves Moreau1•
University of Montpellier1
01 Oct 2000-Materials Science in Semiconductor Processing
TL;DR: In this article, the local refractive index change necessary to guide the light may be imprinted with a simple UV exposure, and the basic structure of guides and hence to make optical circuits which cover the domain of power splitters to wavelength division multiplexers, including directional couplers, gratings, etc.

47 citations

Journal Article•10.1016/S1369-8001(00)00056-1•
Optical study of porous silicon buried waveguides fabricated from p-type silicon

[...]

Joël Charrier1, Cyril Lupi, Lazhar Haji1, Christian Boisrobert•
University of Rennes1
01 Oct 2000-Materials Science in Semiconductor Processing
TL;DR: In this article, the optical buried waveguides fabricated from porous silicon layers are presented, and the modulation of the waveguiding-layer refractive index and the losses on waveguide fabricated from p +.

34 citations

Journal Article•10.1016/S1369-8001(00)00002-0•
Study of diffusion barrier properties of ionized metal plasma (IMP) deposited TaN between Cu and SiO2

[...]

Yuan-Kun Lee1, Khin Maung Latt1, Kim Jaehyung1, Kangsoo Lee2•
Nanyang Technological University1, Singapore Science Park2
01 Jun 2000-Materials Science in Semiconductor Processing
TL;DR: In this article, the diffusion barrier properties of IMP deposited TaN between Cu and SiO 2 have been investigated in the Cu (200mm)/TaN (30mm)/SiO 2 (250nm)/Si multi-layer structure.

32 citations

Journal Article•10.1016/S1369-8001(00)00054-8•
Low dielectric constant porous silica films formed by photo-induced sol–gel processing

[...]

Jun-Ying Zhang1, Ian W. Boyd1•
University College London1
01 Oct 2000-Materials Science in Semiconductor Processing
TL;DR: In this article, the formation of porous silicon dioxide films on Si and quartz substrates at low temperatures (25-300°C) by photo-induced sol-gel processing using 172-nm radiation from an excimer lamp has been investigated.

30 citations

Journal Article•10.1016/S1369-8001(00)00092-5•
Transmission of a microcavity structure in a two-dimensional photonic crystal based on macroporous silicon

[...]

Albert Birner1, Albert Birner2, An-Ping Li1, Frank Müller1, Ulrich Gösele1, P. Kramper3, Vahid Sandoghdar3, Jürgen Mlynek3, Kurt Busch4, Volker Dr. Lehmann2 •
Max Planck Society1, Infineon Technologies2, University of Konstanz3, Karlsruhe Institute of Technology4
01 Oct 2000-Materials Science in Semiconductor Processing
TL;DR: Using electrochemical pore formation in n-type silicon, the starting positions of the pores were photolithographically pre-defined to form a hexagonal lattice of a=1.58mm as discussed by the authors.

24 citations

Journal Article•10.1016/S1369-8001(00)00041-X•
Radiation effects in silicon detectors processed on carbon and oxygen-rich substrates

[...]

Arie Ruzin1, Gianluigi Casse2, M Glaser1, F Lemeilleur1, J Matheson1, Stephen Watts3, A Zanet1 •
Tel Aviv University1, University of Liverpool2, Brunel University London3
01 Aug 2000-Materials Science in Semiconductor Processing
TL;DR: In this article, the results of silicon detectors fabricated on bulk float-zone (FZ) material enriched either by carbon or by oxygen were reported, and the detectors were irradiated by nuclear reactor neutrons, by 24 GeV/c protons and by 192 MeV pions.

21 citations

Journal Article•10.1016/S1369-8001(00)00006-8•
Atomistic modeling of chemical vapor deposition: silicon nitride CVD from dichlorosilane and ammonia

[...]

Alexander A. Bagaturyants, Konstantin P. Novoselov, A. A. Safonov, L.L Savchenko, J.V Cole1, Anatoli Korkin1 •
Motorola1
01 Mar 2000-Materials Science in Semiconductor Processing
TL;DR: The mechanism and kinetics of chemical vapor deposition of silicon nitride films from SiH2Cl2 and NH3 have been studied theoretically by ab initio (MP2/MC-31G(d,p)) methods combined with the transition state and RRKM theories as mentioned in this paper.

19 citations

Journal Article•10.1016/S1369-8001(00)00064-0•
Ferroelectric-domain-inverted gratings by electron beam on LiNbO3

[...]

C. Restoin1, C. Darraud-Taupiac1, J.L. Decossas1, J.C. Vareille1, Jerome Hauden2 •
University of Limoges1, University of Franche-Comté2
01 Oct 2000-Materials Science in Semiconductor Processing
TL;DR: In this paper, a ferroelectric-inverted grating is achieved using electron beam (EB) on LiNbO 3, and the EB irradiation is performed with a scanning electron microscope (SEM) featuring a maximum accelerating voltage of 30kV.
Journal Article•10.1016/S1369-8001(00)00070-6•
Integration of optical interconnects and optoelectronic elements on wafer-scale

[...]

P. Dannberg, L. Erdmann, A. Krehl, C. Wächter, A. Brauer 
01 Oct 2000-Materials Science in Semiconductor Processing
TL;DR: In this paper, the UV-reaction molding technology enabling for the fabrication of microoptical elements with rectangular, triangular or circular cross-sections (waveguides, prisms, lenses) in optical polymers is described.
Journal Article•10.1016/S1369-8001(00)00083-4•
Planar integration of a polarization-insensitive optical switch with holographic elements

[...]

Vincent Moreau1, Yvon Renotte1, Yves Lion1•
University of Liège1
01 Oct 2000-Materials Science in Semiconductor Processing
TL;DR: In this paper, the authors propose a planar switch based on a reflective polarizing hologram sandwiched between two planar substrates, where the optical paths are controlled by total internal reflection in a liquid crystal cell.
Journal Article•10.1016/S1369-8001(00)00039-1•
Defect kinetics in novel detector materials

[...]

B. MacEvoy1, G. Hall1•
Imperial College London1
01 Aug 2000-Materials Science in Semiconductor Processing
TL;DR: In this article, a model of the evolution of defect concentrations and consequent electrical behavior in detector materials with various oxygen and carbon impurity concentrations was presented. But the model was not applied to the case of the CERN Large Hadron Collider, where unprecedented particle fluences will cause significant atomic displacement damage.
Journal Article•10.1016/S1369-8001(00)00038-X•
High-resolution DLTS Studies of Vacancy-related Defects in Irradiated and in Ion-implanted n-type Silicon

[...]

J. H. Evans-Freeman1, Anthony R. Peaker1, I. D. Hawkins1, P. Y. Y. Kan1, Jonathan G. Terry1, L. Rubaldo2, M. Ahmed3, Stephen Watts3, L. Dobaczewski4 •
University of Manchester1, Centre national de la recherche scientifique2, Brunel University London3, Polish Academy of Sciences4
01 Aug 2000-Materials Science in Semiconductor Processing
TL;DR: Using high-resolution Laplace deep-level transient spectroscopy (DLTS) as mentioned in this paper, the electron emission characteristics of vacancy-related defects in silicon were compared using high-energy protons and electron-irradiated silicon.
Journal Article•10.1016/S1369-8001(00)00050-0•
Prediction of the morphology of the as-implanted damage in silicon using a novel combination of BCA and MD simulations

[...]

Matthias Posselt
01 Aug 2000-Materials Science in Semiconductor Processing
TL;DR: In this article, a combination of computer simulations based on the binary collision approximation (BCA) with classical molecular dynamics (MD) calculations is proposed to predict type and amount of defects created by keV ions under realistic implantation conditions.
Journal Article•10.1016/S1369-8001(00)00059-7•
Room-temperature light-emitting diodes with Ge islands

[...]

L. Vescan1, O. Chretien1, T Stoica, E. Mateeva2, A. Mück1 •
Forschungszentrum Jülich1, Colorado School of Mines2
01 Oct 2000-Materials Science in Semiconductor Processing
TL;DR: In this paper, a self-organised growth of lattice-mismatched layers is proposed to increase the contribution of the radiative recombination to the emission of SiGe nanostructures.
Journal Article•10.1016/S1369-8001(00)00080-9•
Photophysical properties of nano Si/SiOx composites in Al/composite/mono Si structures for green light emitting and photodetector-Schottky diodes

[...]

E. Buzaneva1, A. Gorchinsky1, Galina Popova1, T Veblaya1, S. Zankovych1, Yu Boiko1, P Zolotarenko1, Valerij Pogorelov1, V. Bukalo1, A. Benilov1, S Lazarouk, S Beyliss1, A Starovoitov2, A. Senkevich3 •
Taras Shevchenko National University of Kyiv1, De Montfort University2, National Academy of Sciences of Ukraine3
01 Oct 2000-Materials Science in Semiconductor Processing
TL;DR: The concept of self-formation of a nanocrystallite (nc-) Si/SiO x ǫ:Si z O y Al nanocomposite at the Al/oxidized porous silicon interface in the result of solid phase processes between Al and oxidized porous Si (PS) and the influence of its composition on photophysical properties were developed and experimentally confirmed for the Si chip with optical intra-chip interconnect consisting of light emitting and photodetector diodes and alumina waveguide on oxidized PS surface with aluminum electrodes.
Journal Article•10.1016/S1369-8001(00)00095-0•
MOVPE growth of GaAsN: surface study by AFM and optical properties

[...]

Laurent Auvray1, H. Dumont1, J. Dazord1, Yves Monteil1, Jean Bouix1, Catherine Bru-Chevallier2, L. Grenouillet2 •
Centre national de la recherche scientifique1, Institut national des sciences Appliquées de Lyon2
01 Oct 2000-Materials Science in Semiconductor Processing
TL;DR: In this paper, the growth of GaAs1−xNx thin films on GaAs substrates (2° off) by metalorganic vapor-phase epitaxy, in the temperature range 500-600°C.
Journal Article•10.1016/S1369-8001(00)00031-7•
Study of diffusion barrier properties of ternary alloy (TixAlyNz) in Cu/TixAlyNz/SiO2/Si thin film structure

[...]

Yuan-Kun Lee1, Khin Maung Latt1, Thomas Osipowicz2, Cham Sher-Yi2•
Nanyang Technological University1, National University of Singapore2
01 Jun 2000-Materials Science in Semiconductor Processing
TL;DR: In this paper, the effects of aluminum incorporation on the performance of a titanium nitride (TiN) diffusion barrier were investigated up to the temperature of 1000°C in the Cu/TixAlyNz/SiO2/Si structure.
Journal Article•10.1016/S1369-8001(00)00091-3•
Excimer laser fabrication of diffractive optical elements

[...]

Richard J. Winfield, Martin Meister, Gabriel M. Crean, S. Paineau
01 Oct 2000-Materials Science in Semiconductor Processing
TL;DR: In this paper, the authors used computer phase retrieval code to create XY co-ordinate data files for conversion to machining routines where the pixels are machined individually, in order that a reconstructed pattern is formed in the image plane when the DOE is illuminated by a coherent source.
Journal Article•10.1016/S1369-8001(00)00007-X•
Modeling of SiGe deposition using quantum chemistry techniques for detailed kinetic analysis

[...]

M. Hierlemann1, C. Werner1•
Infineon Technologies1
01 Mar 2000-Materials Science in Semiconductor Processing
TL;DR: In this paper, quantum chemistry techniques are used to investigate kinetics of chemical reactions involved in the deposition of SiGe heterolayers, and gas-phase reaction pathways for GeH4 decomposition are proposed and relevant reaction rates are evaluated.
Journal Article•10.1016/S1369-8001(00)00053-6•
Sol–gel derived germanium sulfide planar waveguides

[...]

Jian Xu, Rui M. Almeida
01 Oct 2000-Materials Science in Semiconductor Processing
TL;DR: In this article, the feasibility of preparing germanium sulfide planar waveguides via sol-gel processing was demonstrated, and a two-step method was used: (1) germania oxide gel films were deposited by spin-coating onto single-crystal silicon wafers or silica glass substrates, using germanIUM ethoxide as the precursor; (2) the gel film were then heat treated in a H2S atmosphere, under different conditions.
Journal Article•10.1016/S1369-8001(00)00084-6•
Possibilities to increase the resolution of photoelectric incremental rotary encoders

[...]

N Dumbrǎvescu, S Schiaua
01 Oct 2000-Materials Science in Semiconductor Processing
TL;DR: In this article, the authors used a combined technique: selective electroless nickel deposition on both sides of a copper foil, followed by its nickel-masked wet etching, to manufacture very thin, ultraflat, stress-compensated metal disks, thus achieving two major advantages, as compared to the classical construction.
Journal Article•10.1016/S1369-8001(00)00094-9•
Cooperative two-photon effects in chalcogenide photoresists

[...]

B. G. Sfez, G. Rosenblum, Z. Kotler, Victor Lyubin1, M. Klebanov1 •
Ben-Gurion University of the Negev1
01 Oct 2000-Materials Science in Semiconductor Processing
TL;DR: In this article, a comprehensive study of the dynamics of the pulse photoresponse of 0.3-1.0μm thick chalcogenide glassy As50Se50 thin films using a transient-grating method was presented.
Journal Article•10.1016/S1369-8001(00)00036-6•
Diffusion of ion-implanted boron impurities into pre-amorphized silicon

[...]

N. Ohno1, Tohru Hara2, Yasuhiko Matsunaga3, Michael I. Current, Morio Inoue4 •
Intel1, Hosei University2, Applied Materials3, Kyoto University4
01 Jun 2000-Materials Science in Semiconductor Processing
TL;DR: In this article, the effects of fluorine dose and anneal temperature on the fluorine profile peak and near the amorphous-crystalline interface are compared and compared to results for BF + 2 implants.
Journal Article•10.1016/S1369-8001(00)00013-5•
Kinetic Monte Carlo simulations: an accurate bridge between ab initio calculations and standard process experimental data

[...]

Martín Jaraíz, E. Rubio, Pedro Castrillo, Lourdes Pelaz, Luis Bailón, Juan Barbolla, George H. Gilmer1, Conor S. Rafferty1 •
Alcatel-Lucent1
01 Mar 2000-Materials Science in Semiconductor Processing
TL;DR: In this article, the authors describe the KMC atomistic process simulation scheme and discuss some of the unique features of this simulation technique with the help of results obtained with it, including the link between parameters obtained from ab initio calculations and experiments performed under typical processing conditions.
Journal Article•10.1016/S1369-8001(00)00065-2•
InAlGaAs bulk micromachined tunable Fabry–Pérot filter for dense WDM systems

[...]

J. Pfeiffer1, J. Peerlings1, R. Riemenschneider1, R Genovese1, M. Aziz1, E Goutain, H. Künzel, W Görtz2, G Böhm, M.C Amann, P. Meißner1, Hans L. Hartnagel1 •
Technische Universität Darmstadt1, Deutsche Telekom2
01 Oct 2000-Materials Science in Semiconductor Processing
TL;DR: In this paper, the authors report on micromechanically tunable Fabry-Perot filter concepts for wavelength division multiplexing (WDM) systems, where the optical resonator is designed for a cavity length around 30μm in order to increase the filter selectivity while relaxing the demands on the required mirror reflectance.
Journal Article•10.1016/S1369-8001(00)00049-4•
Regrowth of heavy-ion implantation damage by electron beams

[...]

I Jenčič1, I.M Robertson2•
Jožef Stefan Institute1, University of Illinois at Urbana–Champaign2
01 Aug 2000-Materials Science in Semiconductor Processing
TL;DR: In this paper, the authors showed that regrowth occurs below the displacement threshold and moreover, regrowth rate increases when decreasing electron energy below ∼100, ∼125 and ∼200 Ã 0.
Journal Article•10.1016/S1369-8001(00)00086-X•
Experiments for 3-D structuring of thick resists by gray tone lithography

[...]

N. Dumbravescu
01 Oct 2000-Materials Science in Semiconductor Processing
TL;DR: In this article, a 3D shape of negative and positive 3D shapes in positive and negative polarity is presented in SEM micrographs, only for positive 3-D shapes, and also the results obtained by using the wall type test structure for aspect ratio evaluation.

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