14 Papers
41 Citations
Zhenfei Luo is an academic researcher from University of Electronic Science and Technology of China. The author has contributed to research in topics: Thin film & Sputter deposition. The author has an hindex of 5, co-authored 12 publications.
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Papers
Microstructures and thermochromic properties of tungsten doped vanadium oxide film prepared by using VOX–W–VOX sandwich structure
TL;DR: In this paper, X-ray photoelectron spectroscopy, Xray diffraction and field emission scanning electron microscope were employed to characterize the compositions, crystal structures and surface morphologies of Tungsten doped vanadium oxide (VO X ) thin films.
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Dual-channel graph contrastive learning for self-supervised graph-level representation learning
TL;DR: In this paper , the authors proposed a dual-channel contrastive learning (DualGCL) framework for self-supervised graph-level representation learning. But the dualGCL model requires graph augmentation, which is expensive and requires expert efforts.
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Comparison of the optical responses of O-poor and O-rich thermochromic VOX films during semiconductor-to-metal transition
TL;DR: In this paper, O-poor and O-rich thermochromic vanadium oxide (VO X ) nanostructured thin films were prepared by applying reactive direct current magnetron sputtering and post-annealing in oxygen ambient.
15
Growth, electrical, and optical properties of nanocrystalline VO2 (011) thin films prepared by thermal oxidation of magnetron sputtered vanadium films
TL;DR: In this article, Nanocrystalline vanadium dioxide (VO2) thin films were prepared on glass substrates at different deposition temperatures by oxidizing sputtered vanadium films.
11
Patent
Method for preparing tungsten-doped vanadium oxide film
Zhiming Wu,Yadong Jiang,Mingjun Du,Zhenfei Luo,Tao Wang,Xiangdong Xu +5 more
- 23 Nov 2011
TL;DR: In this paper, a method for preparing a tungsten-doped vanadium oxide film, comprising of the following steps of placing the cleaned substrate into a high vacuum chamber, introducing high-purity argon gas into a vacuum chamber; respectively, carrying out sputter cleaning on the surfaces of a metal vanadium target and a metal tengsten target by turning on vanadium targets sputter power supply under the condition that the substrate is shielded by using a substrate baffle.
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