Zeming Wang
Harbin Institute of Technology
3 Papers
11 Citations
Zeming Wang is an academic researcher from Harbin Institute of Technology. The author has contributed to research in topics: Sputter deposition & Cavity magnetron. The author has an hindex of 3, co-authored 3 publications.
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Papers
Microstructure and mechanical properties of CrN films fabricated by high power pulsed magnetron discharge plasma immersion ion implantation and deposition
TL;DR: In this article, a high power pulsed magnetron sputtering (HPPMS) is used to generate a macroparticle free chromium plasma, which is then processed by high voltage pulses to conduct PIII&D.
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Novel plasma immersion ion implantation and deposition hardware and technique based on high power pulsed magnetron discharge.
TL;DR: A novel plasma immersion ion implantation technique based on high power pulsed magnetron sputtering (HPPMS) discharge that can produce a high density metal plasma that can be readily scaled up for industrial production is described.
12
Antibacterial copper-containing titanium nitride films produced by dual magnetron sputtering
TL;DR: In this article, copper-containing titanium nitride films were fabricated on commercial stainless steel using hybrid processes combining dual magnetron sputtering for antibacterial surface properties through copper doping for consumer products such as household hardware.