Z. Hubička
Charles University in Prague
4 Papers
29 Citations
Z. Hubička is an academic researcher from Charles University in Prague. The author has contributed to research in topics: Thin film & Plasma channel. The author has an hindex of 3, co-authored 4 publications. Previous affiliations of Z. Hubička include Academy of Sciences of the Czech Republic.
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Papers
Cu3N films prepared by the low-pressure r.f. supersonic plasma jet reactor: Structure and optical properties
František Fendrych,L. Soukup,Lubomir Jastrabik,Miloš Šícha,Miloš Šícha,Z. Hubička,Z. Hubička,Dagmar Chvostova,Alexander Tarasenko,V. Studnička,T. Wagner +10 more
TL;DR: In this paper, a low-pressure r.f. supersonic plasma jet reactor (RPJ) was used for deposition of Cu3N thin films and the typical value of the deposition growth rate was found to be in the order of 16nm−min−1 for r. f. power Pw≈40 W.
37
The high pressure torch discharge plasma source
Vratislav Kapička,Miloš Šícha,Miloš Klíma,Z. Hubička,J. Touš,Antonín Brablec,Pavel Slavíček,J.F. Behnke,Milan Tichý,Robert Vaculík +9 more
TL;DR: In this paper, a plasma source based on the principle of arc torch discharge is presented. But the system is not suitable for high pressure of working gas up to atmospheric pressure inside the plasma-chemical reactor and also in free space.
18
The Interaction of the Supersonic Plasma‐Jet with the Substrate in the RF Plasma‐Chemical Reactor
Miloš Šícha,Z. Hubička,Milan Tichý,M. Novák,L. Soukup,Lubomir Jastrabik,J. F. Behnke,Vratislav Kapička,K. Kapoun,M. Šerý +9 more
TL;DR: In this paper, a CCD camera was used to measure the intensity of plasma-chemical deposition processes on the substrate surface and the results indicated that the light intensity recorded close to the substrate can be used as a measure of the intensity.
10
Generation of Supersonic Plasma Flow by Means of Unipolar RF Discharges
M. Novák,Miloš Šícha,Vratislav Kapička,Lubomir Jastrabik,L. Soukup,Z. Hubička,Miloš Klíma,Pavel Slavíček,Antonín Brablec +8 more
TL;DR: In this article, the RF unipolar hollow cathode discharge has been used as a source of the plasma channel, and the advantage of this system is that it is possible to use it up to atmospheric pressure of the working gas and even in the liquid environment.