Yujin Jang
Yeungnam University
20 Papers
14 Citations
Yujin Jang is an academic researcher from Yeungnam University. The author has contributed to research in topics: Atomic layer deposition & Thin film. The author has an hindex of 6, co-authored 12 publications.
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Papers
Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition
TL;DR: In this article, a self-limited film growth on the thermally-grown SiO2 substrate was observed with both the precursor and reactant pulsing time, and the growth rate was ∼ 0.05nm/cycle and a short incubation cycle of around 13 was observed at a deposition temperature of 175-225°C.
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Adverse Human Health Effects of Chromium by Exposure Route: A Comprehensive Review Based on Toxicogenomic Approach
TL;DR: In this paper , the toxic effects of heavy metal exposure through three exposure routes: dermal contact, inhalation, and ingestion were explored, and the underlying toxicity mechanisms of Cr exposure based on transcriptomic data and various bioinformatic tools.
Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications
Seungmin Yeo,Dip K. Nandi,R. Rahul,Tae Hyun Kim,Bonggeun Shong,Yujin Jang,Jong Seong Bae,Jeong Woo Han,Soo-Hyun Kim,Hyungjun Kim +9 more
TL;DR: In this paper, Tungsten disulfide (WS2) thin films are grown on several types of substrates by plasma-enhanced atomic layer deposition (PEALD) technique using tungsten hexacarbonyl [W(CO)6] and H2S plasma at a relatively low temperature of 350°C.
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Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
Yujin Jang,Jun Beom Kim,Tae Eun Hong,So Jeong Yeo,Sunju Lee,Eun Ae Jung,Bo Keun Park,Taek-Mo Chung,Chang Gyoun Kim,Do-Joong Lee,Han-Bo-Ram Lee,Soo-Hyun Kim +11 more
TL;DR: In this paper, an atomic layer deposition (ALD) was used to grow a self-limited thin film with a linear dependency of the film thickness on the number of ALD cycles and showed a growth rate of 0.028nm/cycle on a thermally grown SiO 2 substrate.
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Low temperature atomic layer deposited molybdenum nitride-Ni-foam composite: An electrode for efficient charge storage
Dip K. Nandi,Sumanta Sahoo,Tae Hyun Kim,Taehoon Cheon,Taehoon Cheon,Soumyadeep Sinha,R. Rahul,Yujin Jang,Jong-Seong Bae,Jaeyeong Heo,Jae-Jin Shim,Soo-Hyun Kim +11 more
TL;DR: In this paper, Molybdenum nitride (MoNx) was directly grown on 3-dimensional Ni-foam (NF) at relatively low temperature of 250°C by atomic layer deposition (ALD) and then tested as an electrode for charge storage.
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