ユアン ジエ
5 Papers
18 Citations
ユアン ジエ is an academic researcher. The author has contributed to research in topics: Ceramic & Molar concentration. The author has an hindex of 2, co-authored 5 publications.
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Papers
Patent
Apparatus and method for reducing erosion rate of surface exposed to halogen-containing plasma
Kenneth S. Collins,Ren-Guan Duan,Jennifer Y. Sun,Li Xu,Jie Yuan,エス コリンズ ケネス,ユアン ジエ,ワイ サン ジェニファー,スー リー,デュアン レングアン +9 more
- 07 Apr 2008
TL;DR: In this paper, the authors proposed a multi-phase ceramic which is multi-phased, typically including at least two phases or three phases, to provide a ceramic article resistant to erosion by a halogen-containing plasma used in semiconductor processing.
10
Patent
Plasma-proof ceramics equipped with controlled electric resistivity
Kenneth S. Collins,Ren-Guan Duan,Thomas Graves,Xiaoming He,Jennifer Y. Sun,Senh Thach,Jie Yuan,エス コリンズ ケニス,ユアン ジエ,ワイ サン ジェニファー,ヒー シャオミング,サッチ センハ,グレーブス トーマス,デュアン レングアン +13 more
- 27 Sep 2007
TL;DR: In this article, a specific ceramic material having corrosion/erosion resistance in semiconductor processing conditions using a corrosive/erosive plasma was proposed, where the corrosive plasma may be a halogen-containing plasma.
5
Patent
Manufacturing method and apparatus for plasma reaction apparatus component
Elmira Ryabova,Richard Lewington,Madhavi R. Chandrachood,Amitabh Sabharwal,Darin Bivens,Jennifer Y. Sun,Jie Yuan,サバハルワル アミタブフ,リャボバ エルミラ,ユアン ジエ,サン ジェニファー,ビベンス ダリン,アール チャンドラチュッド マドハビ,レウイントン リチャード +13 more
- 23 May 2012
TL;DR: In this paper, a solid yttria sample is prepared at the beginning of the processing process, and the sample is sintered by exposing the sample to a high temperature environment, and a component is formed by machining the sample.
2
Patent
Method of manufacturing part for plasma reaction apparatus, and apparatus
Darin Bivens,Madhavi R. Chandrachood,Richard Lewington,Elmira Ryabova,Amitabh Sabharwal,Jennifer Y. Sun,Jie Yuan,サバハルワル アミタブフ,リャボバ エルミラ,ユアン ジエ,サン ジェニファー,ビベンス ダリン,アール チャンドラチュッド マドハビ,レウイントン リチャード +13 more
- 29 Oct 2007
TL;DR: In this paper, the authors propose a method of manufacturing yttria parts, which consists of sintering a sample, machining a sintered sample to form a part and heating and annealing the part at a predetermined heating rate.
1
Patent
Method and apparatus which reduce erosion rate of surface exposed to halogen-containing plasmas
ワイ サン ジェニファー,Jennifer Y. Sun,デュアン レングアン,Ren-Guan Duan,ユアン ジエ,Jie Yuan,スー リー,Li Xu,エス コリンズ ケネス,Kenneth S. Collins +9 more
- 28 May 2015
TL;DR: In this article, the authors proposed a multi-phase multiphase ceramic article which is resistant to erosion by halogen-containing plasmas used in semiconductor processing, which can be obtained by ceramic-coating a surface of a body with material through well-known art such as plasma spraying.