7 Papers
24 Citations
Yi Yang is an academic researcher from University of Illinois at Chicago. The author has contributed to research in topics: Chemical vapor deposition & X-ray photoelectron spectroscopy. The author has an hindex of 6, co-authored 7 publications.
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Papers
Atomic layer deposition and characterization of stoichiometric erbium oxide thin dielectrics on Si(1 0 0) using (CpMe)3Er precursor and ozone
TL;DR: In this paper, thin stoichiometric erbium oxide films were shown to start crystallizing in the cubic structure with dominant (2 2 2 2 O 3 ) orientation, showing that no carbon contamination was found at the interface after annealing at 800°C in N 2.
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Low-Pressure Metallorganic Chemical Vapor Deposition of Fe2O3 Thin Films on Si(100) Using n-Butylferrocene and Oxygen
TL;DR: In this paper, α-Fe 2 O 3 thin films have been deposited on Si(100) substrates using n-butylferrocene and oxygen in a low-pressure metallorganic chemical vapor deposition reactor.
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Metallorganic Chemical-Vapor-Deposited BiFeO3 Films for Tunable High-Frequency Devices
Manish Singh,Yi Yang,Christos G. Takoudis,Alexander Tatarenko,Gopalan Srinivasan,P. Kharel,G. Lawes +6 more
TL;DR: In this article, the first use of a room-temperature liquid iron precursor, n-butylferrocene, to deposit polycrystalline BiFeO 3 films by metallorganic chemical vapor deposition was reported.
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Multiferroic BiFeO 3 thin films for multifunctional devices
Manish Singh,Yi Yang,Christos G. Takoudis,Alexander Tatarenko,Gopalan Srinivasan,P. Kharel,G. Lawes +6 more
TL;DR: The metalorganic chemical vapor deposition of crystalline BiFeO3 films on platinized silicon substrates using n-butylferrocene, triphenylbismuth and oxygen based on thermogravimetric analysis data shows the suitability of these two precursors for depositing Bi FeO3.
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Chemical Vapor Deposition of Nickel Ferrite Using Ni C5H5 2 and Fe C5H4C4H9 C5H5
TL;DR: In this paper, a low-pressure chemical vapor deposition system was used to deposit thin films of nickel oxide (NiO) and iron oxide (Fe 2 O 3 ) on silicon substrates.
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