Yawei Lin
Wuhan University of Technology
4 Papers
12 Citations
Yawei Lin is an academic researcher from Wuhan University of Technology. The author has contributed to research in topics: Oxygen evolution & Thin film. The author has an hindex of 4, co-authored 4 publications.
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Papers
Effective Improvement on Barrier Capability of Chemical Vapor Deposited WSi x Using N 2 Plasma Treatment
TL;DR: In this paper, the thermal stability of WSiN/WSi x bilayer was investigated with in situ N 2 plasma treatment on the chemically vapor deposited WSi x (CVD-WSI x ) surfaces.
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Thin‐Film Properties and Barrier Effectiveness of Chemically Vapor Deposited Amorphous WSi x Film
TL;DR: In this paper, the authors investigated thin-film properties and barrier effectiveness against copper diffusion of a thin amorphous WSi x layer using the chemical vapor deposition (CVD) method using the SiH 4 /WF 6 chemistry with the activation energy determined to be 3.0 kcal/mol.
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