Wei Gao
Jilin University
8 Papers
11 Citations
Wei Gao is an academic researcher from Jilin University. The author has contributed to research in topics: Thin film & Nitride. The author has an hindex of 3, co-authored 8 publications.
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Papers
Self-assembly based plasmonic nanoparticle array coupling with hexagonal boron nitride nanosheets.
TL;DR: This work is the first demonstration on evolution of plasmon resonance and charge-based interactions dependent on metal/BNNS interface, thus providing straightforward implications to further develop BNNS-based plAsmonics, optoelectronics, and electronics.
14
Graphene-facilitated synthesized vertically aligned hexagonal boron nitride nanowalls and their gas adsorption properties.
TL;DR: The hierarchical h-BN nanowalls exhibit an enhanced gas adsorption performance, not only through physisorption owing to the synergistic combination of different porous geometries, but also through chemisor adaptation via the open edge groups.
11
Thick c-BN films deposited by radio frequency magnetron sputtering in argon/nitrogen gas mixture with additional hydrogen gas
TL;DR: In this article, the compositions and the microstructure morphologies of cubic boron nitride (c-BN) films are systematically investigated with respect to the ratio of H2 gas content to total working gas.
4
Patent
Gas sensitive element based on hexagonal boron nitride nano sheet/iron oxide nano particle composite material and preparation method and application thereof
Hong Yin,He Yue,Chen Fang,Sun Yanfeng,Wei Gao +4 more
- 20 Sep 2019
TL;DR: In this paper, a gas sensitive element based on a hexagonal boron nitride nano sheet/iron oxide nano particle composite material and a preparation method and application thereof, belonging to the technical field of semiconductor materials.
Patent
Hexagonal boron nitride thick film based on ion beam sputtering deposition, preparation method and application
Hong Yin,Dongdong Li,Wei Gao +2 more
- 18 Sep 2020
TL;DR: In this article, a hexagonal boron nitride thick film based on ion beam sputtering deposition, a preparation method and application, is presented. But the method is not suitable for semiconductor materials.