W. Ehrfeld
Carl Zeiss AG
9 Papers
106 Citations
W. Ehrfeld is an academic researcher from Carl Zeiss AG. The author has contributed to research in topics: LIGA & Lithography. The author has an hindex of 7, co-authored 9 publications.
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Papers
Fabrication technologies for microsystems utilizing photoetchable glass
TL;DR: In this article, photo-etchable glass has been used for the production of microstructures for a wide variety of micro-systems, which can be applied in a corrosive and high temperature environment.
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Investigation of the adhesive strength of PMMA structures on substrates obtained by deep X-ray lithography
TL;DR: In this paper, the adhesive strength of PMMA microcolumns was determined as a function of the dose deposited below the mask absorber by breaking tension measurements applying a new experimental method.
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Accuracy of structure transfer in deep X-ray lithography
TL;DR: In this paper, a computer program has been developed to investigate the significance of various physical effects to the dose distribution in the resist material, which in turn determines the lateral structure resolution.
22
Aligned double exposure in deep X-ray lithography
TL;DR: In this article, the alignment of mask and substrate is performed using a newly developed X-ray Scanner (JENOPTIK GmbH) with internal optical alignment system.
20
Microsystem technology between research and industrial application
TL;DR: In this article, the development of dedicated microfabrication technologies is summarized and recent developments of microsystems for typical application fields are shown, and specific problems of industrial application are discussed.
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