V. Rigato
31 Papers
205 Citations
V. Rigato is an academic researcher. The author has contributed to research in topics: Thin film & Silicon. The author has an hindex of 10, co-authored 31 publications.
Chat about Author
Papers
Preparation of microcrystalline silicon–carbon films
U. Coscia,G. Ambrosone,S. Lettieri,P. Maddalena,V. Rigato,S. Restello,Eugenia Bobeico,Mario Tucci +7 more
TL;DR: In this article, the effects of discharge parameters on the properties of hydrogenated silicon-carbon films deposited by PECVD system have been investigated and the optical energy gap can be tuned in the 1.86-1.96 eV range and the dark conductivity decreases by about three orders of magnitude.
35
Chemical, morphological and nano-mechanical characterizations of Al2O3 thin films deposited by metal organic chemical vapour deposition on AISI 304 stainless steel
TL;DR: Amorphous alumina coatings of different thickness have been deposited on AISI 304 stainless steel substrates by MOCVD in a hot wall reactor at 380°C under O 2 /H 2 O atmosphere as mentioned in this paper.
35
Effects of ion bombardment and gas incorporation on the properties of Mo/a-Si:H multilayers for EUV applications
V. Rigato,Alessandro Patelli,Gianluigi Maggioni,G. Salmaso,V. Mattarello,Maria Guglielmina Pelizzo,Piergiorgio Nicolosi,Laura E. Depero,Elza Bontempi,Paolo Mazzoldi +9 more
TL;DR: In this article, a study of Mo/a-Si:H multilayer for EUV mirrors produced by rf-magnetron sputtering in pure Ar, Xe and Ar/H 2 gas mixtures is presented.
22
Development of microstrip gas chambers on substrates with electronic conductivity
R. Bouclier,C. Garabatos,G. Manzin,F. Sauli,L. Shekhtman,T. Temmel,G. Della Mea,Gianluigi Maggioni,V. Rigato,I. Logachenko +9 more
- 01 Aug 1994
TL;DR: In this paper, several recent developments on microstrip gas chambers (MSGCs) have been described, including a new technique to coat regular glass with a thin lead silicate layer having an electron conductivity; a new development consisting in coating already manufactured MSGCs with the thin semiconducting layer is also described.
Boronization with trimethylboron in the reversed field pinch RFX
Piergiorgio Sonato,V. Antoni,W.R. Baker,R. Bertoncello,A. Buffa,L. Carraro,S. Costa,G. Della Mea,Lionello Marrelli,A. Murari,M. E. Puiatti,V. Rigato,P. Scarin,L. Tramontin,M. Valisa,S. Zandolin +15 more
TL;DR: In this paper, the first wall and the vessel of the Reversed Field Pinch RFX have been in situ coated with a B/C:H film by glow discharge cleaning with a mixture of 12.5% of trimethylboron ((CH3)3B) in He.
17