Disclosed is a material for forming a silicon-containing film, which contains at least one organosilane compound represented by the following general formula (1). (In the formula, R1-R6 may be the same or different and represent a hydrogen atom, an alkyl group having 1-4 carbon atoms, a vinyl group, a phenyl group, a halogen atom, a hydroxy group, an acetoxy group, a phenoxy group or an alkoxy group, and at least one of R1-R6 represents a halogen atom, a hydroxy group, an acetoxy group, a phenoxy group or an alkoxy group; and n represents an integer of 0-3.)

Material for forming silicon-containing film, and silicon-containing insulating film and method for forming the same

L'invention porte sur une matiere de formation d'un film contenant du silicium, qui contient au moins un compose organosilane represente par la formule generale suivante (1). (Dans la formule, R1-R6 peuvent etre identiques ou differents et representent un atome d'hydrogene, un groupe alkyle ayant 1-4 atomes de carbone, un groupe vinyle, un groupe phenyle, un atome d'halogene, un groupe hydroxy, un groupe acetoxy, un groupe phenoxy ou un groupe alcoxy, et au moins l'un de R1-R6 represente un atome d'halogene, un groupe hydroxy, un groupe acetoxy, un groupe phenoxy ou un groupe alcoxy; et n represente un entier de 0-3).

Matière de formation d'un film contenant du silicium, et film isolant contenant du silicium et son procédé de fabrication

Organosilicon compounds. cxli. proton acceptor ability of halogens in organosilicon compounds

Organosilicon compounds part 132, the infrared spectra of some silylalkyl acetates, germylalkyl acetates, and their complexes with zncl2, the electronic effect of silylmethyl and germylmethyl groups in silylmethyl and germylmethyl ace

Organosilicon Compounds. Part 134. Electronic Interactions Displayed in the Spectra of Substituted Alkoxytrimethylsilanes.

Organogermanium-verbindungen 10. mitt. einfluss der struktur auf die basizitaet von aethyl-(dimethylamino)-germanen

Organosiliciumverbindungen 75. mitt. relative basizitaeten von cyclosilazanen und cyclogermazanen

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