Ted Minshall
Lam Research
6 Papers
18 Citations
Ted Minshall is an academic researcher from Lam Research. The author has contributed to research in topics: Substrate (printing) & Clamping. The author has an hindex of 3, co-authored 6 publications.
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Papers
Patent
Systems and Methods for Suppressing Parasitic Plasma and Reducing Within-Wafer Non-Uniformity
Hu Kang,Adrien Lavoie,Shankar Swaminathan,Jun Qian,Chloe Baldasseroni,Frank L. Pasquale,Andrew Duvall,Ted Minshall,Jennifer L. Petraglia,Karl Leeser,David Smith,Sesha Varadarajan,Edward Augustyniak,Douglas Keil +13 more
- 25 Mar 2015
TL;DR: In this article, the parasitic plasma reducing element is configured to reduce parasitic plasma between the showerhead and the upper surface of the processing chamber, which is used to selectively generate RF plasma in the reaction volume.
9
Patent
Systems and methods for reducing backside deposition and mitigating thickness changes at substrate edges
Sesha Varadarajan,Shankar Swaminathan,Saangrut Sangplung,Frank L. Pasquale,Ted Minshall,Adrien Lavoie,Mohamed Sabri,Cody Barnett +7 more
- 12 Sep 2014
TL;DR: In this paper, a substrate processing system for depositing film on a substrate includes a processing chamber defining a reaction volume and including a substrate support for supporting the substrate, and a gas delivery system is configured to introduce process gas into the reaction volume of the processing chamber.
5
Patent
Valve manifold deadleg elimination via reentrant flow path
Karl Leeser,Saangrut Sangplung,Shankar Swaminathan,Frank L. Pasquale,Chloe Baldasseroni,Ted Minshall,Adrien Lavoie +6 more
- 22 Jul 2015
TL;DR: A gas delivery system for a substrate processing system including first and second valves, a first gas channel, and a cylinder is described in this article, where the cylinder is at least partially disposed within the first channel such that the cylinder and the first gas channels collectively define a flow channel and the flow channel is in fluid communication with the second end of the second gas channel and with the first inlet.
3
Patent
Substrate processing system for suppressing parasitic plasma and reducing non-uniformity within wafer
フー・カン,Hu Kang,エイドリアン・ラボイエ,Adrien Lavoie,シャンカー・スワミナタン,Shankar Swaminathan,ジュン・チエン,Jun Qian,クロエ・バルダッセローニ,Chloe Baldasseroni,フランク・パスクァーレ,Frank L. Pasquale,アンドリュー・デュバル,Andrew Duvall,テッド・ミンシャル,Ted Minshall,ジェニファー・エル．・ペトラグリア,Jennifer L. Petraglia,カール・リーサー,Karl Leeser,デビッド・バーナード・スミス,David Smith,セシャ・バラダラジャン,Sesha Varadarajan,エドワード・アウグスティニャック,Edward Augustyniak,ダグラス・ケイル,Douglas Keil +27 more
- 03 Sep 2015
TL;DR: In this paper, the authors proposed a method for suppressing parasitic plasma and reducing non-uniformity within a wafer. But this method requires the use of an edge tuning system.
1
Patent
Gas delivery system for a substrate processing system
Karl Leeser,Saangrut Sangplung,Shankar Swaminathan,Frank L. Pasquale,Chloe Baldasseroni,Ted Minshall,Adrien Lavoie +6 more
- 21 Dec 2020
TL;DR: A gas delivery system for a substrate processing system including first and second valves, a first gas channel, and a cylinder is described in this paper, where the cylinder is at least partially disposed within the first channel such that the cylinder and the first gas channels collectively define a flow channel and the flow channel is in fluid communication with the second end of the second gas channel and with the first inlet.