Takeshi Shundo
Nagoya Institute of Technology
3 Papers
9 Citations
Takeshi Shundo is an academic researcher from Nagoya Institute of Technology. The author has contributed to research in topics: Dielectric & Leakage (electronics). The author has an hindex of 1, co-authored 3 publications.
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Papers
Preparation and Investigation on Magneto-Electric Effect of Cr2O3 Thin Films
TL;DR: In this paper, the magneto-electric properties and electric properties of Cr2O3 thin films were investigated on a thermal-oxidized Si substrate and a c-Al 2O3 substrate.
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Magnetic and Dielectric Properties of a Metal/ Cr2O3/Cr2O3-x/Cr2O3/Semiconductor Capacitor Using Magneto-Electric Materials
Takeshi Yokota,Takaaki Kuribayashi,Takeshi Shundo,Keita Hattori,Yasutoshi Sakakibara,Manabu Gomi +5 more
TL;DR: In this article, the magnetic and dielectric properties of a metal (Pt)/insulator (Cr2O3)/semiconductor (Si) (MIS) capacitor composed of magneto-electric (ME) materials were investigated.
Capacitance Tunability of Magneto-electric Material:Cr2O3 using Ferromagnetic (La,Sr)MnO3 Electrode
Takeshi Yokota,Takaaki Kuribayashi,Takeshi Shundo,Keita Hattori,Yasutoshi Sakakibara,Manabu Gomi +5 more
TL;DR: In this article, the dielectric properties of the Cr 2 O 3 films using ferromagnetic electrode; (La 0.66, Sr 0.33 )MnO 3.