An organic light emitting display apparatus and a method of manufacturing the same are disclosed. The organic light emitting display apparatus includes, for example, a bus electrode, an insulating layer covering the bus electrode and having a bus electrode hole exposing at least a part of the bus electrode, a pixel electrode formed on the insulating layer and electrically coupled with the bus electrode, a pixel defining layer exposing a part of the pixel electrode and a part of the bus electrode, a first intermediate layer on the pixel defining layer and the pixel electrode, the first intermediate layer having a first opening to expose the part of the bus electrode, an emission layer disposed on the first intermediate layer, and an opposite electrode to correspond to the pixel electrode and the bus electrode and contacting the bus electrode through the first opening and the bus electrode hole.

Organic light-emitting display apparatus and method of manufacturing the same

A film deposition method includes steps of transferring a substrate having a pattern including a concave part into a vacuum chamber; supplying a first reaction gas to the substrate from a first reaction gas supplying part, thereby allowing the first reaction gas to be adsorbed on the substrate; supplying a second reaction gas that reacts with the first reaction gas to the substrate from a second reaction gas supplying part, thereby allowing the first reaction gas adsorbed on the substrate to react with the second reaction gas and forming a reaction product of the first and the second reaction gases on the substrate; supplying an alteration gas to the substrate through an activated gas supplying part capable of activating the alteration gas; and supplying an etching gas to the substrate chamber through the activated gas supplying part under an environment where the reaction product is not formed.

Film deposition apparatus and film deposition method

Provided is a substrate processing apparatus The substrate processing apparatus includes a lower chamber having an opened upper side, an upper chamber opening or closing the upper side of the lower chamber, the upper chamber defining an inner space, in which a process is performed on a substrate, together with the lower chamber, a showerhead disposed on a lower portion of the upper chamber to supply a reaction gas toward the inner space, wherein a buffer space is defined between the showerhead and the upper chamber, a partition member disposed in the buffer space to partition the buffer space into a plurality of diffusion regions, and a plurality of gas supply ports disposed in the upper chamber to supply the reaction gas toward each of the diffusion regions

Substrate processing apparatus and substrate processing method

In a substrate processing apparatus for forming thin layers on a substrate used for an organic light emitting diode, the apparatus includes a mask attaching chamber, a deposition chamber and a mask detaching chamber. The mask attaching chamber, the deposition chamber and the mask detaching chamber are provided with a transferring guide installed thereinside, and a substrate supporter for supporting the substrate moves along the transferring guide in or between the chambers. Thus, a time for processing the substrate and an area for the apparatus may be reduced. Also, the chambers are grouped in one or more, and a gate valve is installed between the grouped chambers for opening and closing a path between the grouped chambers. Accordingly, the chambers may be continuously maintained in a vacuum state when any one of the chambers is repaired.

Apparatus for processing substrate

A substrate processing chamber and methods for processing multiple substrates is provided and generally includes a gas distribution assembly, a susceptor assembly to rotate substrates along a path adjacent each of the gas distribution assembly and a gas diverter to change the angle of gas flow in the processing chamber.

Tilted Plate For Batch Processing And Methods Of Use

The present invention relates to a gas injection apparatus and a substrate processing apparatus using the same. The gas injection apparatus according to the present invention is installed at an upper part of a substrate supporting portion for supporting a plurality of substrates which is rotatably installed in an inside of a chamber. The gas injection apparatus comprises a plurality of gas injection units for injecting the process gas onto the substrates which are arranged along a circumferential direction on the basis of a central point of the substrate supporting portion, wherein at least one of the gas injection units comprises: a top plate having an inlet in which the process gas is introduced; and an injection plate which is arranged at a lower part of the top plate to form a gas diffusion space along a radius direction of the substrate supporting portion apart from the top plate and includes a plurality of gas injection holes formed at a lower side of the gas diffusion space to inject onto the substrate the process gas which is introduced through the inlet and is diffused in the gas diffusion space. The gas injection apparatus is characterized in that the process gas is introduced from a plurality of points to the gas diffusion space.

Gas injection apparatus and substrate processing apparatus using same

Provided are a gas injecting device and a substrate processing apparatus including the same The gas injecting device includes gas injecting units installed at an upper side of a substrate support part rotatably installed in a chamber to support substrates, the gas injecting units being arrayed in a circumferential direction of the substrate support part about a center of the substrate support part to inject process gas to the substrates At least one of the gas injecting units includes a top plate having an introduction hole through which the process gas is introduced, and an injecting plate disposed at a lower side of the top plate to form a gas diffusion space in a radial direction of the substrate support part between the injecting plate and the top plate, and having gas injecting holes disposed at a lower side of the gas diffusion space

Gas injecting device and substrate processing apparatus including the same

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Gas injection apparatus and substrate processing apparatus using same

Gas injecting device and substrate processing apparatus including the same