In this paper, we shall briefly present some recent works done on lithium niobate fibers and waveguides. There are two major parts. The first part introduces the fabrication techniques for LiNbO 3 fibers and waveguides, which include the growth of lithium niobate fibers by laser-heated pedestal growth method and the fabrication high aspect ratio submicron lithium niobate waveguide by focused ion beam lithography. The second part focuses on the application of lithium niobate fibers and waveguides, which include holographic storage in lithium niobate fibers, fast speed wavelength tunable filter, subpicosecond true time delay line, and low crosstalk microchannel plate spatial light modulator. Finally, a brief summary is provided.

Lithium niobate fibers and waveguides : Fabrications and applications : Photorefractive materials, devices, and applications, Part 1: Optical effects and memories

The thesis presents a novel technique for realizing smooth micro-scale etched features on lithium niobate. Etching of lithium niobate is observed when annealing two wafers in contact with an intermediate titanium strip. A variety of etching characteristic

Surface machining lithium niobate using Ti diffusion technique

We present a novel method of etching lithium niobate during the Ti diffusion process. A hypothesis for this etching process is explained by defining the kinetics of the Ti diffusion process as an electrochemical reaction. The Ti ions diffuse into the X cut LiNbO3 crystal by swapping with Nb ions generating an electric field. Investigations were carried out by placing a bare LiNbO3 wafer on top of the Ti patterned LiNbO3 substrate during the diffusion process in a wet oxygen atmosphere. The built-in electric field during the Ti diffusion process is neutralised with the bare LiNbO3 placed on top and is evident from the material removal that takes place from the top bare substrate and deposited on the bottom substrate were Ti is diffused. Hence the bare substrate is etched in the regions where Ti is present on the bottom substrate. Features can be arbitrarily defined (using Ti etching) and can have dimensions of 1 micron or smaller. Etch depths of the order of 1 micron have been demonstrated while maintaining smooth surfaces. The crystalline nature of the etched surface is analysed using X-ray diffraction techniques. The refractive index measurement and the surface roughness of the etched surface are also presented.

Etching lithium niobate during Ti diffusion process

We report a novel technique for micro texturing of LiNbO3. Well-defined raised ridges and etched trenches are demonstrated. This technique is suitable for the realization of surface relief gratings and photonic crystals.

/pdf/wafer-scale-texturing-of-linbo-3-2xe4hjpo4c.pdf

Wafer Scale Texturing of LiNbO 3

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Wafer Scale Texturing of LiNbO 3

Etching lithium niobate during Ti diffusion process