As system security demands continue to evolve, Physically Unclonable Functions (PUFs) are a promising solution for secure storage on Integrated Circuits (ICs). SRAM PUFs are among the most popular types of PUFs, since they require no additional circuitry and can be implemented with on-die memories such as caches and data memory that are readily available on both ASICs and FPGAs. This work demonstrates that SRAM PUFs are not well suited as PUFs, as they do not meet several requirements that constitute an ideal PUF. The compact nature of SRAM, standard interconnects and resiliency to environmental effects make SRAM PUFs particularly easy to clone. We consider several ways in which SRAM PUFs can be characterized and demonstrate a Focused Ion Beam circuit edit with which we were able to produce a physical clone of our Proof-of-Concept SRAM PUF implementation. As a result of the circuit edit, when challenged, the physical clone produced an identical physical response to the original device. To the best of our knowledge, this is the first work in which a physical clone of a Physically Unclonable Function was produced.

Cloning Physically Unclonable Functions

To locate and correct design errors that escape pre-silicon verification, silicon debug has become a necessary step in the implementation flow of digital integrated circuits. Embedded logic analysis, which employs on-chip storage units to acquire data in real time from the internal signals of the circuit-under-debug, has emerged as a powerful technique for improving observability during in-system debug. However, as the amount of data that can be acquired is limited by the on-chip storage capacity, the decision on which signals to sample is essential when it is not known a priori where the bugs will occur. In this paper, we present accelerated algorithms for restoring circuit state elements from the traces collected during a debug session, by exploiting bitwise parallelism. We also introduce new metrics that guide the automated selection of trace signals, which can enhance the real-time observability during in-system debug.

Algorithms for State Restoration and Trace-Signal Selection for Data Acquisition in Silicon Debug

Among other things, an accelerator (502) is mounted on a gantry (504) to enable the accelerator to move through a range of positions around a patient (506) on a patient support. The accelerator is configured to produce a proton or ion beam having an energy level sufficient to reach any arbitrary target in the patient from positions within the range. The proton or ion beam passes essentially directly from the accelerator to the patient. In some examples, the synchrocyclotron has a superconducting electromagnetic structure that generates a field strength of at least 6 Tesla, produces a beam of particles having an energy level of at least 150 MeV, has a volume no larger than 4.5 cubic meters, and has a weight less than 30 Tons.

Charged particle radiation therapy

An image processing apparatus includes a plurality of addition means and an image processing means. The addition means performs addition processing of adding pixels of a differential image at a second resolution representing a difference between an inputted image at a first resolution and an image at the second resolution higher than the first resolution as pixels of an inputted image at the second resolution. The image processing means is configured to perform second and subsequent addition processing, and generate an image of the second resolution as a processing result by performing the addition processing for a predetermined number of times. The addition processing is performed with inputs of an image at the first resolution and an image at the second resolution obtained by an immediately preceding addition processing, which are different from each other.

Image processing apparatus, image processing method and program

A synchrocyclotron comprises a resonant circuit that includes electrodes having a gap therebetween across the magnetic field. An oscillating voltage input, having a variable amplitude and frequency determined by a programmable digital waveform generator generates an oscillating electric field across the gap. The synchrocyclotron can include a variable capacitor in circuit with the electrodes to vary the resonant frequency. The synchrocyclotron can further include an injection electrode and an extraction electrode having voltages controlled by the programmable digital waveform generator. The synchrocyclotron can further include a beam monitor. The synchrocyclotron can detect resonant conditions in the resonant circuit by measuring the voltage and or current in the resonant circuit, driven by the input voltage, and adjust the capacitance of the variable capacitor or the frequency of the input voltage to maintain the resonant conditions. The programmable waveform generator can adjust at least one of the oscillating voltage input, the voltage on the injection electrode and the voltage on the extraction electrode according to beam intensity and in response to changes in resonant conditions.

Programmable radio frequency waveform generator for a synchrocyclotron

A plurality of images, including a first image and a second image having a higher resolution than the first image, are aligned by generating an oversampled cross correlation image that corresponds to relative displacements of the first and second images, and, based on the oversampled cross correlation image, determining an offset value that corresponds to a misalignment of the first and second images. The first and second images are aligned to a precision greater than the resolution of the first image, based on the determined offset value. Enhanced results are achieved by performing another iteration of generating an oversampled cross correlation image and determining an offset value for the first and second images. Generating the oversampled cross correlation image may involve generating a cross correlation image that corresponds to relative displacements of the first and second images, and oversampling the cross correlation image to generate the oversampled cross correlation image.

Sub-resolution alignment of images

Faster defect localization is achieved by combining IC simulations and internal measurements. Time resolved photon emission records photons emitted during commutations (current) rather than determining the voltage states. Comparing measured waveforms with simulations (STIL/VCD) localizes functional faults and timing issues. Summary Software diagnosis makes it possible to investigate many IC defects with fault simulation tools. Internal probing techniques, such as time resolved photon emission (TRP), can access "otherwise inaccessible" nodes. Hardware diagnosis can fine-tune the defect analyses and validate simulations by contributing "actual" measurements. The combination of software diagnosis and internal probing can reduce simulation time and internal measurements for faster localization of the defect. The challenge is to determine quickly if a measurement is good or not: Can some signal be measured (the transistor is at least activated)? Are the measured delays matching the simulation? If ATE detects a problem, the method presented in the paper saves time in locating the fault site by applying simulations to determine the duration and location of a meaningful measurement.

Fault localization using time resolved photon emission and stil waveforms

A charged particle guide adapted to be coupled with a charged particle detector, such as a secondary electron detector. The charged particle guide, in one example, comprising two wires extending from the charged particle detector toward a source of charged particles, such as secondary electrons emitted from an IC upon application of a focused ion beam. Upon application of a bias voltage, the charged particle guide introduces a collecting electric field that attracts charged particles and directs the charged particles to the charged particles detector.

Charged particle guide

An apparatus and method for processing an integrated circuit employing optical interference fringes. During processing, one or more wavelength lights are directed on the integrated circuit and based upon the detection of interference fringes and characteristics of the same, further processing may be controlled. One implementation involves charged particle beam processing of an integrated circuit as function of detection and/or characteristics of interference fringes. A charged particle beam trench milling operation is performed in or on the substrate of an integrated circuit. Light is directed on the floor of the trench. Interference fringes may be formed from the constructive or destructive interference between the light reflected from the floor and the light from the circuit structures. Resulting fringes will be a function, in part, of the thickness and/or profile of the trench floor. Milling may be controlled as a function of the detected fringe patterns.

Apparatus and method for optical interference fringe based integrated circuit processing

A method and apparatus for optimizing an integrated circuit design for post-fabrication circuit editing and diagnostics. The method and apparatus is specifically directed to adding designed-for-edit modifications and designed-for-diagnostics structures to an integrated circuit design for post-fabrication circuit editing with a charged-particle beam tool. An integrated circuit design may be modified to create efficient and reliable access to specified nodes and structures, such as spare gates, by the charged-particle beam tool during subsequent testing and debugging of the fabricated device. Additionally, structures such as spare gates, spare transistors, spare metal wires, and debug circuitry may be added to an integrated circuit design to provide for easier editing of portions of the design that may fail.

Apparatus and method for integrated circuit design for circuit edit

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