Scaling analysis of minor hysteresis loops in ferromagnets with large uniaxial anisotropy

The invention provides a determination method for dislocation density of large-size block iron and steel materials, which comprises the following steps of 1 preparing a standard test sample; 2 testing the standard test sample, determining magnetization rate x scale and coercive force Hc scale of the test sample, and further determining constant c scale of a standard test sample; 3 testing the standard test sample, determining the dislocation density rho scale of the standard test sample, and further determining the values of a coefficient b and a coefficient K; 4 preparing a test sample I to be tested; 5 testing magnetization rate x I and coercive force Hc I of the test sample; 6 jointly establish a formula x=c/Hc3 and a formula c=b+Krho, and obtaining the dislocation density rhoI; and repeating step 4-step 6 when testing a test sample II to be tested made of the same material and has the same preparation method with the test sample I to be tested. The determination method for the dislocation density of large-size block iron and steel materials has the advantages that a test result can reflect microscopic distribution of the dislocation density inside the test sample, and the method is simple, fast, easy to grasp and wide in use range.

Determination method for dislocation density of large-size block iron and steel materials

Nickel (Ni) thin films are commonly used in the integrated circuit field. Magnetron sputtering is a common method for thin film deposition, and the sputtering target is the key raw material in the magnetron sputtering process. In this work, cold-rolled and annealed Ni targets were prepared. The microstructures and magnetic properties of the Ni targets were analyzed. Then, Ni films were prepared by direct current magnetron sputtering with the above two Ni targets. The Ni films were characterized by scanning electron microscopy, atomic force microscopy, grazing incidence x-ray diffraction, x-ray reflectivity, and four-probe testing. Finally, the surface morphologies of the targets were compared before and after sputtering, and the relationships between the Ni targets and the Ni films were discussed. The results show that with the same conditions, the annealed Ni target is more efficiently utilized, and the electrical properties of the Ni films are good when the film is macrostructurally smooth and microstructurally compact. This is due to the target texture, magnetic properties, etc.

Formation of thin films via cold-rolled/annealed nickel sputtering targets

Variation of electrochemical impedance with dislocation density was investigated using electrochemical impedance spectroscopy (EIS). For this purpose, EIS measurements were carried out on 10, 20, 30, 40, and 50% cold-rolled commercially pure copper in 0.1 M NaCl (pH = 2) solution. Nyquist plots illustrated that the electrochemical reactions are controlled by both charge transfer and diffusion process. Increasing dislocation density, the magnitude of electrochemical impedance of samples was decreased. Decreasing magnitude of impedance at intermediate frequencies indicated increasing double-layer capacitance. Charge transfer resistance decreased from value 329.6 Ωcm2 for annealed sample to 186.3 Ωcm2 for sample with maximum dislocation density ( ). Phase angles were lower for samples that contained more dislocation density, indicating more tendencies to loss of electrons and releasing atoms into electrolyte.

/pdf/an-investigation-on-dislocation-density-in-cold-rolled-4g12ixb1if.pdf

An Investigation on Dislocation Density in Cold-Rolled Copper Using Electrochemical Impedance Spectroscopy

Seven scaling power-law relations were discovered in the minor hysteresis loops of ferromagnetic materials several years ago. These relations include universal constants that are independent of the type of material and temperature, along with coefficients that provide information about the material and lattice defects. Four universal constants and four coefficients are explained in connection with the Rayleigh relation, which is caused by two scaling laws for l(H) and p(H), where l(H) is the pinning and unpinning length in the domain wall displacement, H is the magnetic field, and p(H) is the number of domain walls involved. The dependence of the coefficients on the dislocation density, ρ, is explained to increase in proportion to the square root of ρ. This result agrees with experimental results. The force profile of the domain walls has similar structures at every point.

Rayleigh relation and scaling power laws in minor hysteresis loops

Quantitative evaluation of dislocation density using minor-loop scaling relations

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Quantitative evaluation of dislocation density using minor-loop scaling relations