PROBLEM TO BE SOLVED: To provide a vapor deposition mask that is both higher in precision and lightweight even when made large-sized and can form a high-precision vapor deposition pattern while maintaining strength, a vapor deposition mask manufacturing method and a vapor deposition mask preparation body such that the vapor deposition mask can be easily manufactured, and a manufacturing method for organic semiconductor element in which a high-precision organic semiconductor element can be manufactured.SOLUTION: A metal mask 10 provided with a plurality of slits 15 and a resin mask 20 are stacked, and the resin mask 20 is provided with opening parts 25 needed for constituting a plurality of screens. The opening parts 25 correspond to a pattern to be manufactured by vapor deposition, and each slit 15 is provided at a position where the slit overlaps at least one entire screen.

Vapor deposition mask, vapor deposition mask preparation body, and manufacturing method for organic semiconductor element

The invention discloses a flexible mask plate. The flexible mask plate comprises a flexible substrate, and a bonding layer, a metal pattern structure layer and a flexible encapsulation layer are sequentially arranged on the flexible substrate; the flexible substrate is made of a transparent flexible material; the material of the flexible substrate is polycarbonate or polydimethylsiloxane; the material of the bonding layer is an epoxy resin adhesive; the material of the metal pattern structure layer is aluminum or copper; and the material of the flexible encapsulation layer is polydimethylsiloxane. The invention provides the flexible mask plate and a making method thereof. The flexible mask plate can photo-etch a curved surface substrate and can be naturally adsorbed to the substrate to realize close contact without a traditional vacuum-pumping treatment, so the flexible mask plate is suitable for the large-area substrate photo-etching.

Flexible mask plate and making method thereof

The invention discloses a flexible screen manufacturing method and a glass substrate stripping method. The flexible screen manufacturing method and the glass substrate stripping method comprise the following steps that first, a glass substrate is coated with a layer of polyimide, then an LTPS organic layer is manufactured on the polyimide, and at last thin film packaging is conducted; second, a manufactured device is treated through a hydrofluoric acid solution; third, hydrofluoric acid solution residuals on the treated device are cleared away; fourth, the device is dried. To sum up, the flexible screen manufacturing method and the glass substrate stripping method have the advantages of being simple in technological process, capable of not affecting the degree of adhesion between the polyimide layer and LTPS, fast in pace and low in cost.

Flexible screen manufacturing method and glass substrate stripping method

The present disclosure relates to a method for manufacturing a metal thin film wire. The fabricated metal thin film conductor is used for realizing electrical connection between electronic devices and/or inside electronic devices on a flexible substrate. The method comprises: sequentially generating a mask layer and a mask protective layer on the substrate; Transferring the mask pattern onto the mask protective layer to form a mask protective layer pattern; The mask layer is etched according to the pattern of the mask protective layer to form the etched mask layer; Transferring the etched masklayer to the flexible substrate; Using the etched mask layer as a mask, metal thin film conductors are formed on the flexible substrate. Wherein the pattern of the etched mask layer and the pattern of the metal film conductor are complementary in shape. As that method provide by the embodiment of the present disclosure has wide application range, the required metal thin film wire can be directlygenerated on a flexible substrate, and the generated metal thin film wires have high precision and can meet the use requirement of the metal thin film wires.

method for manufacturing a metal thin film wire

The invention discloses a nanometer through hole array polymer template and a fabrication method thereof. The fabrication method comprises the steps of forming a photoresist layer on the substrate; forming a polymer matrix layer on the photoresist layer; fabricating a nanometer embossing die; depositing an anti-pasting layer on the nanometer embossing die; coinciding the die with an upper surfaceof the polymer matrix layer, and embossing the die onto the photoresist layer by a nanometer embossing system; and sequentially removing a die layer, the substrate and the photoresist to obtain the polymer temperature with a nanometer through array. The fabrication method is simple in process and low in cost, the through hole array polymer template with high depth-width ratio and relatively smallsize can be fabricated, and the polymer template can be widely applied to the fields of micronano biology, medicine, optics, sensing, information and the like.

Nanometer through hole array polymer template and fabrication method thereof

The invention provides a preparation method of a flexible mask. The method comprises steps of: growing a SiO2 layer on a substrate; precipitating a polymer layer on the SiO2 layer; forming hollow mask patterns on the polymer layer; immersing the substrate of the polymer layer containing the hollow mask patterns into a mixed solution containing hydrofluoric acid and ammonium fluoride; and reacting the SiO2 layer with the mixed solution to peel the polymer layer with hollow mask pattern formed thereon off the substrate, so as to form a flexible mask plate. The method of the invention causes no damage on the mask plate, and is simple and easy to operate.

Preparation method of flexible mask plate

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Preparation method of flexible mask plate