77 Papers
118 Citations
Sunbin Deng is an academic researcher from Hong Kong University of Science and Technology. The author has contributed to research in topics: Thin-film transistor & Thin film. The author has an hindex of 10, co-authored 59 publications. Previous affiliations of Sunbin Deng include University of Hong Kong & Huazhong University of Science and Technology.
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Papers
Overcoming the Limitations of Sputtered Nickel Oxide for High-Efficiency and Large-Area Perovskite Solar Cells.
TL;DR: It is shown that the requirements of low fill factor and short‐circuit current commonly observed in sputtered NiOx‐derived PSCs can be satisfied by using the magnetron sputtering, which is well established in the industry.
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Investigation of High-Performance ITO-Stabilized ZnO TFTs With Hybrid-Phase Microstructural Channels
TL;DR: In this paper, the properties of hybrid-phase microstructural indium tin oxide-stabilized ZnO thin films and the relevant high-performance thin-film transistors (TFTs) were systematically investigated.
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Complex oxides for brain-inspired computing: A review.
Tae Joon Park,Sunbin Deng,Sukriti Manna,A. N. M. N. Islam,Haoming Yu,Yifan Yuan,Dillon D. Fong,Alexander A. Chubykin,Abhronil Sengupta,Subramanian K. R. S. Sankaranarayanan,Shriram Ramanathan +10 more
TL;DR: The opportunities presented by complex oxides, a class of electronic ceramic materials whose properties can be elegantly tuned by doping, electron interactions and a variety of external stimuli near room temperature, are discussed.
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High-Performance Staggered Top-Gate Thin-Film Transistors with Hybrid-Phase Microstructural ITO-Stabilized ZnO Channels
Sunbin Deng,Rongsheng Chen,Rongsheng Chen,Guijun Li,Zhihe Xia,Meng Zhang,Wei Zhou,Man Wong,Hoi Sing Kwok +8 more
TL;DR: In this article, the ITO-stabilized ZnO thin films with a hybrid-phase microstructure were introduced, where a number of nanocrystals were embedded in an amorphous matrix.
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Feasible Route for a Large Area Few-Layer MoS2 with Magnetron Sputtering
TL;DR: Continuous and large-area molybdenum disulfide (MoS2) growth on a SiO2/Si substrate by radio frequency magnetron sputtering (RFMS) combined with sulfurization is reported and high quality few-layered MoS2 on a large- area can be achieved by controlling the radio-frequency magnetrons sputtering power.
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