Convex blazed gratings, which can effectively broaden the spectral range and improve spectral resolution, have gradually evolved into a crucial optical component for lightweight and compact imaging spectroscopy instruments. Their design, processing, and testing involve multidisciplinary interdisciplinary scientific issues, and they continue to be a major area of research in imaging optics applications. This paper summarizes the effects of various grating groove shapes and structural parameters on the spectral range and diffraction efficiency of convex blazed gratings, after providing a brief introduction to the typical functions and applications of convex blazed gratings. Firstly, the latest progress in typical processing methods for convex blazed gratings is reviewed. It focuses on the current fabrication processes and reviews their capabilities in creating convex blazed gratings from three main types of technologies, namely ultra-precision machining, high-energy density beam processing, and chemically assisted fabrication processes. Secondly, the adaptability of the manufacturing process for convex blazed gratings on different scales is summarized, analyzing the adaptation of current procedures to various grating fabrication scales and their bottlenecks. Finally, the characterization methods and future feasible characterization methods for convex blazed gratings are reviewed. The development trend of efficient and precise preparation of convex blazed gratings is pointed out.

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Progress in the Preparation and Characterization of Convex Blazed Gratings for Hyper-Spectral Imaging Spectrometer: A Review

A technique is provided which enables preparation of a curved grating having a desired curvature, by plastically deforming, along a curved substrate, a flat grating prepared by a semiconductor process on a silicon substrate, and which thus prepares a diffraction grating with high accuracy. A silicon flat grating prepared by a semiconductor process is transferred to an amorphous material, and the amorphous material substrate is curved and mounted on a curved fixed substrate, thus providing a curved grating having a crystalline material in which the generation of a dislocation line is restrained.

Curved diffraction grating, production method therefor, and optical device

PROBLEM TO BE SOLVED: To provide a technique for fabricating a curved diffraction grating having a desired curvature by plastically deforming a plane diffraction grating fabricated on a silicon substrate by a semiconductor process along a curved surface substrate, and for fabricating a highly accurate diffraction gratingSOLUTION: A plane diffraction grating made of silicon fabricated by the semiconductor process is transferred to an amorphous material, and an amorphous material substrate is curved and mounted on a curved surface fixation substrate, thereby a curved diffraction grating including a crystalline material in which the occurrence of a dislocation line is suppressed is provided

Curved diffraction grating and manufacturing method of the same, and optical device

To form a saw-like diffraction grating pattern on a curved surface substrate by machining, since a tool has a fixed angle, a shape in which the angles of the diffraction grating pattern at the central and outer circumferential sections of the curved surface are different from one another is formed. Also, to form, on a curved surface substrate, a diffraction grating pattern having a serrated shape through a semiconductor process such as photolithography and etching, the adjustment of the focal depth during the photolithography and the adjustment of the etching angle are required, thereby increasing costs. This method of manufacturing a mold for a curved diffraction grating includes: a step for forming a diffraction grating pattern 21 on a metallic planar diffraction grating substrate 20; a step for forming solder 22 on a surface opposite to the surface of the metallic planar diffraction grating substrate 20 on which the diffraction grating pattern is formed; a step for forming, on the curved surface substrate 23, a layer of a junction material 24 which is eutectically bonded to the solder 22,; and a step for sandwiching the metallic planar diffraction grating substrate 20 between the curved surface fixing substrate 23 and the curved surface fixing substrate 24 and applying a load.

Method of manufacturing mold for curved diffraction grating, method of manufacturing curved diffraction grating, curved diffraction grating, and optical device

A diffraction grating comprise a substrate and a plurality of connected diffraction structures formed on the substrate. Each diffraction structure is in the shape of a column and arranged along a concave cylindrical surface, and an axis of each diffraction structure extends along a generatrix of the concave cylindrical surface. A section contour is obtained by a cross section of the diffraction structures. The cross section is perpendicular to each axis of the diffraction structure. The section contour shows the connecting line of apexes of the diffraction structures as a reference curve having a plurality of first inflection points, wherein the diffraction structures are configured for separating the optical signal into a plurality of spectral components and focusing the spectral components onto a focal surface.

SPECTROMETER, MONOCHROMAToR, DIFFRACTION GRATING AND METHODS OF MANUFACTURING GRATING AND MOLD

An objective of the present invention is to manufacture with high precision a curved face diffraction grating having a desired curvature. Provided is a curved face diffraction grating fabrication method, comprising: a step of forming a diffraction grating pattern (20) upon a flat-shaped silicon substrate (2); a step of pressing a fixing substrate (3) in a heated state and having a desired curved face shape upon the silicon substrate (2) whereupon the diffraction grating pattern is formed, curving a face of the silicon substrate, fixing upon the fixing substrate (3) having the curved face shape the silicon substrate (2) having the diffraction pattern, and forming a curved face diffraction grating cast; and a step of bringing a member having flexibility into contact with the curved face diffraction grating cast, and transferring the diffraction grating pattern upon the member.

Curved face diffraction grating fabrication method, curved face diffraction grating cast, and curved face diffraction grating employing same

The present invention has been made in view of the above, and an object thereof is to provide a manufacturing technique capable of manufacturing a diffraction grating which is suitable for use in a spectrophotometer and has an apex angle of a convex portion of about 90° and can satisfy high diffraction efficiency and a low stray light amount. A method of manufacturing a diffraction grating, the method including: setting an exposure condition such that a sectional shape of a convex portion of a resist on a substrate, which has been formed by exposure, is an asymmetric triangle with respect to an opening portion shape of a mask having an opening portion with a periodic structure and an angle formed by a long side and a short side of the triangle is about 90°; and performing exposure.

Diffraction grating manufacturing method, spectrophotometer, and semiconductor device manufacturing method

To provide a technique that can measure a surface profile of any test object in a nondestructive manner and noncontact manner, highly accurately, and in a wide tilt angle dynamic range. In white light interference method using a dual beam interferometer, the technique is configured to be capable of changing a surface orientation of a standard plane with respect to an incident optical axis on the standard plane, acquires, while relatively changing the surface orientation of the standard plane with respect to a local surface orientation in any position on a test surface, a plurality of interferograms generated by interference of reflected light from the test surface and reflected light from the standard plane, and calculates the local surface orientation on the test surface from the interferograms to thereby measure a surface profile of the test surface.

Surface profile measurement method and device used therein

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