Selmer Wong
Rockwell Automation
10 Papers
150 Citations
Selmer Wong is an academic researcher from Rockwell Automation. The author has contributed to research in topics: Photoresist & James Webb Space Telescope. The author has an hindex of 7, co-authored 10 publications.
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Papers
Patent
Enhancement of photoresist plasma etch resistance via electron beam surface cure
Selmer Wong,Matthew F. Ross +1 more
- 28 Dec 1999
TL;DR: In this paper, a process for increasing the etch resistance of the upper surface of photoresists by a surface-intensive dose of electron beam radiation was proposed, which imparts increased surface etch resist to the photoresist without causing as much shrinkage in the bulk of the film.
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Patent
Method for curing spin-on dielectric films utilizing electron beam radiation
William R. Livesay,Matthew F. Ross,Anthony L. Rubiales,Heike Thompson,Selmer Wong,Trey Marlowe,Mark E. Narcy +6 more
- 29 Dec 1999
TL;DR: In this article, an electron beam exposure method is described which provides a means of curing spin-on-glass or spinon-polymer dielectric material formed on a semiconductor wafer.
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Patent
Modification of 193 nm sensitive photoresist materials by electron beam exposure
Matthew F. Ross,Selmer Wong +1 more
- 09 Jun 2000
TL;DR: In this article, a process for increasing the etch resistance of photoresists, especially positive working 193 nm sensitive photoresist which are suitable for use in the production of microelectronic devices such as integrated circuits, is described.
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Mechanism studies of scanning electron microscope measurement effects on 193-nm photoresists and the development of improved line-width measurement methods
T. R. Sarrubi,Matthew F. Ross,Mark Neisser,Thomas Kocab,Bernard T. Beauchemin,William R. Livesay,Selmer Wong,Waiman Ng +7 more
- 24 Aug 2001
TL;DR: In this article, the effect of scanning electron microscope (SEM) measurements on the dimensions of resist features was studied for 193nm resist materials, and it was found that the cured line and spaces patterns did not show significant line width change when repeatedly measured in a SEM.
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Detectors for the James Webb Space Telescope near infrared spectrograph (NIRSpec)
Bernard J. Rauscher,Torsten Böker,Craig A. Cabelli,Guido De Marchi,Pierre Ferruit,James D. Garnett,Robert J. Hill,Markus Loose,Michael W. Regan,Augustyn Waczynski,Yiting Wen,Selmer Wong,M. Zandian,David Alexander,C. Brambora,Rebecca J. Derro,Carol Dunn,Tim Ellis,Matthew B. Garrison,Bryan Howe,Peter Jakobsen,Thomas E. Johnson,Miriam Jurado,Ginn Lee,Sridhar S. Manthripragada,James M. Marsh,Cheryl J. Marshall,Robert J. Martineau,Brent Mott,John Nieznanski,Wayne D. Roher,Kamdin B. Shakoorzadeh,Miles Smith,Paolo Strada,Peter Wallis,Wei Xia-Serafino,James York +36 more
TL;DR: In this paper, the authors summarize recent progress on the NIRSpec detector subsystem including tests demonstrating that JWST's Rockwell HAWAII-2RG sensor chip assemblies have achieved Technology Readiness Level 6 (TRL-6).
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