To keep the polymer web reasonably cool, plasma chemical vapor deposition (CVD) tends is used. The basic process comprises feeding a precursor gas into a vacuum plasma. The plasma has energetic particles and the precursor gas is fragmented. Some of the molecules hit and condense on the substrate surface. Raising the substrate temperature increases the number of adsorbed molecules that are desorbed, and increases the speed and distance of lateral diffusion of the molecules on the surface. Increasing the RF power has the effect of increasing the ionization, plasma potential, and plasma volume. This leads to increased dissociation of the precursor gas. This leads to an increase of the substrate self bias. Increasing the pressure increases the reactant gas density, gas diffusion times, and system residence times. It also decreases the molecular mean free path, gas flow velocity, and plasma volume. Further, there is an interest in depositing fluorinated coatings to give low-energy surfaces that are hydrophobic. These are used in applications such as drug delivery systems to ensure that all the drug is supplied and none remains behind coated on the polymer surfaces. It is also possible to provide rubbing surfaces with some lubricity with a PTFE type-coating.

Chemical Vapor Deposition/Polymerization onto Webs

Publisher Summary
The basic process comprises feeding a precursor gas into vacuum plasma. The plasma has energetic particles and the precursor gas is fragmented. Some of the molecules hit and condense on the substrate surface. The polymer webs have to be kept reasonably cool, and so thermally activated chemical vapor deposition (CVD) tends not to be used, instead plasma-enhanced CVD is preferred. There is an interest in depositing fluorinated coatings to give low-energy surfaces that are hydrophobic. These are used in applications such as drug delivery systems to ensure all the drugs are supplied and none remains behind coated on the polymer surfaces. It is also possible to provide rubbing surfaces with some lubricity with a polytetrafluoroethylene-type coating. Carbon–fluorine plasmas are used for etching semiconductor devices at least as much as, and possibly more than, for the deposition of fluorinated polymers by plasma-enhanced CVD. There are a number of different PECVD coatings that can act as barrier films. These include silica, melamine, and carbon films of various stoichiometries deposited by a variety of methods. Atmospheric plasma deposition technology started out by being an improvement over corona treatment of polymer surfaces.

18 – Chemical Vapor Deposition/Polymerization onto Webs

This chapter presents the various examples of vacuum-coated products. It starts with the metallized films. In a Metallized coating aluminum is deposited using an aluminum wire-fed resistance heated evaporation source. Optical data storage is included in this group as it is based on an aluminum coating and can be deposited by a high-quality metallization process. Holographic coating is also included because the initial holograms were simple aluminum metallized coatings and only recently have they been developed with high refractive index coatings, patterning, semi-transparent coatings, and combinations of these variations. In flake pigments coating, the bulk of the flake pigments are simple aluminum metallized flakes. The basic process for flake manufacture can be used for almost any coating and there are lower volumes of other flake pigments produced although, the value can be considerable. Further, the chapter describes the types of products that are produced by methods other than aluminum metallization.

Products Using Vacuum Deposited Coatings

Keywords: plasma enhanced CVD ; adhesion and cohesion ; permeation barrier coatings ; novel hybrid coatings Reference EPFL-CONF-179146 Record created on 2012-06-29, modified on 2016-08-09

Cohesive Strength and Oxygen Permeability of PECVD-Based Coatings on Semicrystalline Polymers

Keywords: gas-barrier ; interphase ; multifunctional organo-silanes ; silane/SiOx interactions Reference EPFL-CONF-178834 Record created on 2012-06-29, modified on 2016-08-09

Novel multifunctional organo-silane based barrier coatings on polymers

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Cohesive Strength and Oxygen Permeability of PECVD-Based Coatings on Semicrystalline Polymers

Novel multifunctional organo-silane based barrier coatings on polymers