S. El-Safty
University of Manchester
5 Papers
S. El-Safty is an academic researcher from University of Manchester. The author has contributed to research in topics: Creep & Nanoindentation. The author has an hindex of 4, co-authored 4 publications. Previous affiliations of S. El-Safty include Tanta University.
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Papers
Nanomechanical properties of dental resin-composites.
TL;DR: To determine by nanoindentation the hardness and elastic modulus of resin-composites, including a series with systematically varied filler loading, plus other representative materials that fall into the categories of flowable, bulk-fill and conventional nano-hybrid types, the group-average elastic moduli and nanohardnesses for bulk- Fill and flowable materials were lower than those for conventional nano
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Creep deformation of restorative resin-composites intended for bulk-fill placement
TL;DR: The "bulk-fill" composites exhibited an acceptable creep deformation and within the range exhibited by other resin-composite formulations in comparison with some other types.
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Nanoindentation creep versus bulk compressive creep of dental resin-composites.
TL;DR: Evaluating nanoindentation as an experimental tool for characterizing the viscoelastic time-dependent creep of resin-composites and to compare the resulting parameters with those obtained by bulk compressive creep found it to be positively correlated with loading and unloading rates, respectively.
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Temperature-dependence of creep behaviour of dental resin-composites
TL;DR: Creep parameters of resin-composites are sensitive to temperature increase from 23 to 45°C, as can occur intra-orally, and for a given resin matrix, creep decreased with higher filler loading.
16
Synthesis of GaN by electrochemical method at low temperature
S. El-Safty,Y Hayashi +1 more
TL;DR: Li et al. as mentioned in this paper presented a synthesis of GaN thin materials using a simple and low-cost ECD on n-Si (1 1 1) substrates and for the first time below room temperature at 20 oC using different current densities and constant deposition duration.