There is provided a pellicle in which the mask-bonding agglutinant layer has the adhesion strength of 1 N/m through 100 N/m, preferably 4 N/m through 80 N/m, and more preferably the agglutinant layer has a facial flatness of 15 micrometers or smaller, and still more preferably the membrane-bonding adhesive layer has a facial flatness of 15 micrometers or smaller: for the purpose of better preventing the pellicle frame from affecting the mask to deform.

Pellicle for lithography

There is provided a pellicle having a frame 12, a film 11 and an adhesive 13 for bonding the film 11 to the frame 12, and this adhesive 13 is a silicone compound having a low outgassing tendency and high heat resistance; in a better mode case, it can maintain its adhesive strength at temperatures 100 - 200 degrees C and it exhibits results of TML being 1.0 % or lower and CVCM being 0.1 % or lower when tested in accordance with ASTM E595-93; thus this pellicle is useful for EUV light exposure lithography.

A pellicle for lithography

A semiconductor device manufacturing apparatus includes a mask stage including a mask holder system that fixes a photomask, the mask holder system having a first fixing portion mounted at a first position of the mask holder system to fix the photomask, and a second fixing portion at a second position of the mask holder system and spaced apart from the first position, the second fixing portion fixing a pellicle assembly to be spaced apart from the photomask on the first fixing portion.

Semiconductor device manufacturing apparatus

Sterile Processing Departments (SPD) within hospitals are using lean methods to improve process efficiency. In this project, the team utilized the Lean A3 problem solving methodology to examine the root causes of missing instruments at The Academic Medical Center. The team developed several countermeasures through 5S sub-projects, focused on inventory management, facility layout and process flow. The team recommended updating the inventory management system, posting visual work standards and reducing kit variety.

Implementing Lean Process Improvement in the Sterile Processing Department at the Academic Medical Center

Advanced immersion lithography utilizes higher numerical aperture (NA) stepper lenses resulting in higher angles of light illumination through photomasks. Transmission in conventional pellicles (830 nm thickness) is generally maximized at 0 degree illumination and decreases significantly at the higher angles. Most pellicle suppliers have developed thinner pellicle membranes (~280 nm) which allow considerably improved transmission of light at angles up to 20 degrees. In addition, aluminum frames have been shortened, potentially allowing inspection closer to the inside of the frame and reduced mask flatness distortion upon pellicle mount. Suppliers have also developed advanced adhesives which reduce outgassing even beyond the low levels obtained with current 45 nm pellicles. In this paper, advanced immersion pellicles from several suppliers are evaluated and compared with conventional 45 nm pellicles for the following quality parameters: physical durability, foreign material, ease of demounting and glue removal, chemical outgassing, mask flatness distortion and susceptibility to radiation damage. Improvements in mask inspection and pellicle optical transmission at higher incident angles are also evaluated and are discussed. Keywords : Mask flatness, pellicle, adhesive, frame

Evaluation of 32nm advanced immersion lithography pellicles

Previous work has shown that photomask blank flatness as well as photomask patterning and pelliclization all play an
important role in finished photomask flatness. Additional studies have shown that pellicle mounting techniques,
pellicle adhesives, frame flatness and shape and pellicle mounting tools play a role as well. It has become clear that
frame flexibility, coupled with frame mounting surface flatness and shape are the principal factors influencing the
pellicle effect on the mask distortion. Pellicle suppliers have begun to evaluate various polymers as potential
replacements for the standard aluminum frame in current use. The elasticity of the frame adhesive has also been adjusted
to evaluate its effect on the pellicle influence on mask flatness.
This paper describes some joint evaluations between IBM, Toppan and ShinEtsu, performed to determine the effect of
pellicle frame composition,, mount surface flatness, adhesive elasticity and adhesive surface flatness on the distortion of
photolithography masks. It demonstrates that polymer pellicle frames with more flexible adhesive improve finished
mask flatness approximately the same amount as reducing the total frame standoff height of aluminum frames with
conventional adhesive.

Effect of pellicle frame and adhesive material on final photomask flatness

Previous work has shown that photomask blank flatness as well as photomask patterning and pelliclization all play an
important role in finished photomask flatness. Other work has shown that pellicle mounting techniques and pellicle
adhesives play a role as well. In this work, a comparison of the impact of various pellicle types, frame flatness, frame
shape and pellicle mounting tools on final photomask flatness will be shown. Pellicles with various adhesives, frame
shapes and flatness were mounted on blanks and completed photomasks using several mounting tools and the pellicle
induced flatness change was measured. These data will be discussed with the objective of demonstrating the effects of
pellicle type and mounting tool on photomask flatness.

Pellicle factors affecting finished photomask flatness

The present invention describes a structure and method for reducing or eliminating the flatness distortion effects of a photomask assembly which occurs when a pellicle is mounted to the photomask. The invention is to perform a partial disconnection of the mounting area of the pellicle frame from the print area of the mask. An exemplary embodiment of the present invention achieves the distortion reduction or elimination using a trench in the photomask as the partial disconnection.

Method for reducing photo-mask distortion

With the advancement of technology, the need to produce flatter photomasks is critical to
meet strict mask manufacturing requirements. Components such as pellicle mounting
techniques, pellicle frame height, frame material and adhesive all play an important role
in finished photomask flatness.1-5 In particular, recent studies have shown that adhesive
flexibility affect final photomask flatness significantly.6 This has motivated pellicle
suppliers to optimize adhesive properties in addition to evaluate new adhesives.
The paper describes the joint evaluations between IBM, Toppan and MLI, performed to
determine the effect of a new MLI adhesive on the distortion of photomasks. Due to the
nature of this adhesive, minimal mounting force is required. As a result of utilizing
extreme low mounting pressure, benefits such as decreased flatness distortion and ease of
adhesive removal are observed. The goal of this paper is to evaluate this new adhesive
offering and understand the various impacts it has on pelliclized photomasks for
advanced technologies.

Evaluation of easily removable pellicle adhesive

Handle everyday research tasks with reliable, citation-backed results

Your personal Research Agent to handle research tasks with citation-backed results

Popular Tasks used by Researchers

How can I help with your research?

Meet SciSpace

Get more enhanced response by uploading the PDFs you want me to reference.

No relevant PDFs in your library

SciSpace is the AI research assistant for academics. Run systematic literature reviews on 280M+ papers, and write papers with cited sources. Trusted by 1M+ students, PhDs & researchers.

SciSpace | AI for Research

Analyze PDFs

Code & Manuscripts

Funding & Grants

Literature & Patents

Medical & Clinical Data

Systematic Review

Visualize & Present

Web & Data

Build a Google Scholar-like website for your research.

Build a website

Create charts and images for your research

Create a Chart

Write a paper for submission to a journal

Draft a manuscript

Patent Search

Design eye-catching scientific posters in minutes.

Scientific Poster Generation

Systematic Literature Review

One task is running at the moment. Your messages will be shown right after.

Drag and drop or click here to browse

Loved by <highlight>1 million+</highlight> researchers

Extract a list of specific topics and their sources from unstructured text

Topics

Compare and analyze relevant papers that matches with your search

Papers

Get insights from PDFs and bookmarked papers from your library

My library

Recent searches

Try searching for:

Catch AI-generated content in scholarly and non-scholarly content

{ai} Detector

Ai Writer

Get PDF Summaries, highlighted text explanations 

Chat with PDF

Effortlessly create in-text citations and bibliographies in APA and 2,500 other formats

Citation generator

Get explanations, summaries, and answers on academic papers

Ease up your research workflow with {scispace}'s cohort of exciting AI tools

Elevate your academic writing skills and convey your ideas the way you want

Paraphraser

Explore our range of reading and writing tools

Your file is being prepared and should be ready in a few minutes. If it's a large file, it might take a bit longer. You can close this window, and we'll email you the file when it's done.

You have reached a maximum limit of <strong>{limit}</strong> columns in the table. Remove at least <strong>1</strong> column to add or create another one.

Robert Nolan

Author Tools

Chat about Author