Robert John Socha
ASML Holding
134 Papers
1.8K Citations
Robert John Socha is an academic researcher from ASML Holding. The author has contributed to research in topics: Lithography & Process window. The author has an hindex of 27, co-authored 134 publications.
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Papers
Understanding the forbidden pitch and assist feature placement
Xuelong Shi,Stephen Hsu,J. Fung Chen,Chungwei Michael Hsu,Robert John Socha,Mircea Dusa +5 more
- 11 Mar 2002
TL;DR: In this article, it has been shown that the variation of the critical dimension as well as the exposure latitude of the main feature is a direct consequence of light field interference between the main features and the neighboring features.
130
Patent
Illumination optimization for specific mask patterns
Robert John Socha
- 22 Feb 2002
TL;DR: In this paper, a method and apparatus for microlithography is proposed to optimize illumination modes based on characteristics of a specific mask pattern, which is optimized by determining an appropriate illumination mode based on diffraction orders of the reticle, and the autocorrelation of the projection optic.
118
Subresolution process windows and yield estimation technique based on detailed full-chip CD simulation
Yuri Granik,Nicolas B. Cobb,Emile Sahouria,Olivier Toublan,Luigi Capodieci,Robert John Socha +5 more
- 23 Aug 2000
TL;DR: In this paper, a definition of a CD-based process window is proposed to capture the proximity signature of the design and its dependence on process parameters, and the influence of process parameters on strong phase shifted and binary mask designs.
75
An innovative Source-Mask co-Optimization (SMO) method for extending low k1 imaging
Stephen Hsu,Luoqi Chen,Zhipan Li,Sean Park,Keith Gronlund,Hua-yu Liu,Neal Callan,Robert John Socha,Steve Hansen +8 more
- 04 Dec 2008
TL;DR: In this paper, the authors compared an iterative optimization method versus a newly developed simultaneous source-mask optimization approach, and reported that the new method offers significant process window improvement, compared to the iterative method.
72
Extending aggressive low-k1 design rule requirements for 90 and 65 nm nodes via simultaneous optimization of numerical aperture, illumination and optical proximity correction
Sabita Roy,Douglas Van Den Broeke,J. Fung Chen,Armin Liebchen,Ting Chen,Stephen Hsu,Xuelong Shi,Robert John Socha +7 more
TL;DR: The achievable design rule criteria is explored for very low k1-imaging by simultaneously optimizing NA, illumination settings and OPC (for optimum placement of SB) for a calibrated process.
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