Three parallel algorithms for classical molecular dynamics are presented. The first assigns each processor a fixed subset of atoms; the second assigns each a fixed subset of inter-atomic forces to compute; the third assigns each a fixed spatial region. The algorithms are suitable for molecular dynamics models which can be difficult to parallelize efficiently—those with short-range forces where the neighbors of each atom change rapidly. They can be implemented on any distributed-memory parallel machine which allows for message-passing of data between independently executing processors. The algorithms are tested on a standard Lennard-Jones benchmark problem for system sizes ranging from 500 to 100,000,000 atoms on several parallel supercomputers--the nCUBE 2, Intel iPSC/860 and Paragon, and Cray T3D. Comparing the results to the fastest reported vectorized Cray Y-MP and C90 algorithm shows that the current generation of parallel machines is competitive with conventional vector supercomputers even for small problems. For large problems, the spatial algorithm achieves parallel efficiencies of 90% and a 1840-node Intel Paragon performs up to 165 faster than a single Cray C9O processor. Trade-offs between the three algorithms and guidelines for adapting them to more complex molecular dynamics simulations are also discussed.

Fast parallel algorithms for short-range molecular dynamics

Author(s): Lin, Z; McCreary, A; Briggs, N; Subramanian, S; Zhang, K; Sun, Y; Li, X; Borys, NJ; Yuan, H; Fullerton-Shirey, SK; Chernikov, A; Zhao, H; McDonnell, S; Lindenberg, AM; Xiao, K; Le Roy, BJ; Drndic, M; Hwang, JCM; Park, J; Chhowalla, M; Schaak, RE; Javey, A; Hersam, MC; Robinson, J; Terrones, M | Abstract: The rise of two-dimensional (2D) materials research took place following the isolation of graphene in 2004. These new 2D materials include transition metal dichalcogenides, mono-elemental 2D sheets, and several carbide- and nitride-based materials. The number of publications related to these emerging materials has been drastically increasing over the last five years. Thus, through this comprehensive review, we aim to discuss the most recent groundbreaking discoveries as well as emerging opportunities and remaining challenges. This review starts out by delving into the improved methods of producing these new 2D materials via controlled exfoliation, metal organic chemical vapor deposition, and wet chemical means. We look into recent studies of doping as well as the optical properties of 2D materials and their heterostructures. Recent advances towards applications of these materials in 2D electronics are also reviewed, and include the tunnel MOSFET and ways to reduce the contact resistance for fabricating high-quality devices. Finally, several unique and innovative applications recently explored are discussed as well as perspectives of this exciting and fast moving field.

https://iopscience.iop.org/article/10.1088/2053-1583/3/4/042001/pdf

2D materials advances: From large scale synthesis and controlled heterostructures to improved characterization techniques, defects and applications

Using first-principles calculations within density functional theory, we investigate the electronic and chemical properties of a single-layer MoS(2) adsorbed on Ir(111), Pd(111), or Ru(0001), three representative transition metal substrates having varying work functions but each with minimal lattice mismatch with the MoS(2) overlayer. We find that, for each of the metal substrates, the contact nature is of Schottky-barrier type, and the dependence of the barrier height on the work function exhibits a partial Fermi-level pinning picture. Using hydrogen adsorption as a testing example, we further demonstrate that the introduction of a metal substrate can substantially alter the chemical reactivity of the adsorbed MoS(2) layer. The enhanced binding of hydrogen, by as much as ~0.4 eV, is attributed in part to a stronger H-S coupling enabled by the transferred charge from the substrate to the MoS(2) overlayer, and in part to a stronger MoS(2)-metal interface by the hydrogen adsorption. These findings may prove to be instrumental in future design of MoS(2)-based electronics, as well as in exploring novel catalysts for hydrogen production and related chemical processes.

Tuning the Electronic and Chemical Properties of Monolayer MoS$_2$ Adsorbed on Transition Metal Substrates

Self-lubricating composites containing MoS2: A review

Nanoscale transition-metal dichalcogenide (TMDC) materials, such as MoS2, exhibit promising behavior in next-generation electronics and energy-storage devices. TMDCs have a highly anisotropic crystal structure, with edge sites and basal planes exhibiting different structural, chemical, and electronic properties. In virtually all applications, two-dimensional or bulk TMDCs must be interfaced with other materials (such as electrical contacts in a transistor). The presence of edge sites vs basal planes (i.e., the crystallographic orientation of the TMDC) could influence the chemical and electronic properties of these solid-state interfaces, but such effects are not well understood. Here, we use in situ X-ray photoelectron spectroscopy (XPS) to investigate how the crystallography and structure of MoS2 influence chemical transformations at solid-state interfaces with various other materials. MoS2 materials with controllably aligned crystal structures (horizontal vs vertical orientation of basal planes) were fabricated, and in situ XPS was carried out by sputter-depositing three different materials (Li, Ge, and Ag) onto MoS2 within an XPS instrument while periodically collecting photoelectron spectra; these deposited materials are of interest due to their application in electronic devices or energy storage. The results showed that Li reacts readily with both crystallographic orientations of MoS2 to form metallic Mo and Li2S, while Ag showed very little chemical or electronic interaction with either type of MoS2. In contrast, Ge showed significant chemical interactions with MoS2 basal planes, but only minor chemical changes were observed when Ge contacted MoS2 edge sites. These findings have implications for electronic transport and band alignment at these interfaces, which is of significant interest for a variety of applications.

In Situ XPS Investigation of Transformations at Crystallographically Oriented MoS2 Interfaces

With significant recent advancements in thermal sciences—such as the development of new theoretical and experimental techniques, and the discovery of new transport mechanisms—it is helpful to revisit the fundamentals of vibrational heat conduction to formulate an updated and informed physical understanding. The increasing maturity of simulation and modeling methods sparks the desire to leverage these techniques to rapidly improve and develop technology through digital engineering and multi-scale, electro-thermal models. With that vision in mind, this review attempts to build a holistic understanding of thermal transport by focusing on the often unaddressed relationships between subfields, which can be critical for multi-scale modeling approaches. For example, we outline the relationship between mode-specific (computational) and spectral (analytical) models. We relate thermal boundary resistance models based on perturbation approaches and classic transmissivity based models. We discuss the relationship between lattice dynamics and molecular dynamics approaches along with two-channel transport frameworks that have emerged recently and that connect crystal-like and amorphous-like heat conduction. Throughout, we discuss best practices for modeling experimental data and outline how these models can guide material-level and system-level design.

Thermal transport in defective and disordered materials

Engineering semiconductor devices requires an understanding of the effective mass of electrons and holes. Effective masses have historically been determined in metals at cryogenic temperatures estimated using measurements of the electronic specific heat. Instead, by combining measurements of the Seebeck and Hall effects, a density of states effective mass can be determined in doped semiconductors at room temperature and above. Here, a simple method to calculate the electron effective mass using the Seebeck coefficient and an estimate of the free electron or hole concentration, such as that determined from the Hall effect, is introduced mS∗me=0.924(300KT)(nH1020cm−3)2/3[3(exp[|S|kB/e−2]−0.17)2/31+exp[−5(|S|kB/e−kB/e|S|)]+|S|kB/e1+exp[5(|S|kB/e−kB/e|S|)]] here mS∗ is the Seebeck effective mass, nH is the charge carrier concentration measured by the Hall effect (nH = 1/eRH, RH is Hall resistance) in 1020 cm−3, T is the absolute temperature in K, S is the Seebeck coefficient, and kB/e = 86.3 μV K−1. This estimate of the effective mass can aid the understanding and engineering of the electronic structure as it is largely independent of scattering and the effects of microstructure (grain boundary resistance). It is particularly helpful in characterizing thermoelectric materials.

Effective Mass from Seebeck Coefficient

Point defects exist widely in engineering materials and are known to scatter vibrational modes, resulting in reduction in thermal conductivity. The Klemens description of point-defect scattering is the most-prolific analytical model for this effect. This work reviews the essential physics of the model and compares its predictions with first-principles results for isotope and alloy scattering, demonstrating the model to be a useful metric of material design. A treatment of the scattering parameter ($\mathrm{\ensuremath{\Gamma}}$) for a multiatomic lattice is recommended and compared with other treatments presented in the literature, which have been at times misused to yield incomplete conclusions about the system's scattering mechanisms. Additionally, we demonstrate a reduced sensitivity of the model to the full phonon dispersion and discuss its origin. Finally, a simplified treatment of scattering in alloy systems with vacancies and interstitial defects is demonstrated to suitably describe the potent scattering strength of these off-stoichiometric defects.

https://link.aps.org/accepted/10.1103/PhysRevApplied.13.034011

Analytical Models of Phonon–Point-Defect Scattering

Solid-solution alloy scattering of phonons is a demonstrated mechanism to reduce the lattice thermal conductivity. The analytical model of Klemens works well both as a predictive tool for engineering materials, particularly in the field of thermoelectrics, and as a benchmark for the rapidly advancing theory of thermal transport in complex and defective materials. This comment/review outlines the simple algorithm used to predict the thermal conductivity reduction due to alloy scattering, as to avoid common misinterpretations, which have led to a large overestimation of mass fluctuation scattering. The Klemens model for vacancy scattering predicts a nearly 10× larger scattering parameter than is typically assumed, yet this large effect has often gone undetected due to a cancellation of errors. The Klemens description is generalizable for use in ab initio calculations on complex materials with imperfections. The closeness of the analytic approximation to both experiment and theory reveals the simple phenomena that emerges from the complexity and unexplored opportunities to reduce thermal conductivity.

Alloy scattering of phonons

In the discussion and analysis of thermal properties (e.g. heat capacity, thermal conductivity) the Debye approximation is typically used to describe the collective behavior of lattice vibrations (phonons) in solid materials. Because the Debye model has been successful in explaining many properties of materials, particularly in contrast to the non-dispersive model considered by Einstein, theDebyemodel is often the starting point of introductory textbooks in solid state physics. Yet the more we learn about the full spectrum of lattice vibrations, and now can calculate detailed phonon dispersion

Thermal conductivity of complex materials.

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