The present invention relates to a process of making a zinc-oxide-based thin film semiconductor, for use in a transistor, comprising thin film deposition onto a substrate comprising providing a plurality of gaseous materials comprising at least first, second, and third gaseous materials, wherein the first gaseous material is a zinc-containing volatile material and the second gaseous material is reactive therewith such that when one of the first or second gaseous materials are on the surface of the substrate the other of the first or second gaseous materials will react to deposit a layer of material on the substrate and wherein the third gaseous material is inert with respect to reacting with the first or second gaseous materials.

Process for atomic layer deposition

A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.

Lithographic apparatus, and device manufacturing method

The invention provides for devices and methods for interfacing microchips to cartridges and pneumatic manifolds. The cartridges, microchips, and pneumatic manifolds can be integrated with downstream preparation devices, such as thermal regulating devices and separation and analysis devices.

Universal sample preparation system and use in an integrated analysis system

In this paper, we consider the efficient and reliable solution of distributed optimal control problems governed by parametrized elliptic partial differential equations. The reduced basis method is used as a low-dimensional surrogate model to solve the optimal control problem. To this end, we introduce reduced basis spaces not only for the state and adjoint variable but also for the distributed control variable. We also propose two different error estimation procedures that provide rigorous bounds for the error in the optimal control and the associated cost functional. The reduced basis optimal control problem and associated a posteriori error bounds can be efficiently evaluated in an offline–online computational procedure, thus making our approach relevant in the many-query or real-time context. We compare our bounds with a previously proposed bound based on the Banach–Necas–Babuska theory and present numerical results for two model problems: a Graetz flow problem and a heat transfer problem. Finally, we also apply and test the performance of our newly proposed bound on a hyperthermia treatment planning problem.

Certified Reduced Basis Methods for Parametrized Elliptic Optimal Control Problems with Distributed Controls

A biomedical microfluidic device for separating a sub-population of particles from a first fluid, particularly a biological fluid, has means for separation and/or filtration of the fluid, which include a first microfluidic path defined in a first body of the device, a first inlet for introduction of a first fluid in the first path and at least a first outlet for discharge from the first path of a sample of fluid enriched in the sub-population of particles.

Microfluidic devices and/or equipment for microfluidic devices

Computer simulations of hepatic radio-frequency ablation (RFA) were performed to: (i) determine the dependence of the vessel wall heat transfer coefficient on geometrical parameters; (ii) study the...

Simulation study of the cooling effect of blood vessels and blood coagulation in hepatic radio-frequency ablation.

Method and apparatus for depositing film on flexible (plastic/metal) foil and/or temperature sensitive substrates (101) by combustion chemical vapor deposition (C- CVD). A substrate (101) is held in place to provide physical and conductive thermal contact between the substrate (101) and a substrate holder (102). The substrate holder (102) is cooled using a cooling fluid and the substrate (101) and burner are moved relative to each other as C-CVD takes place. Heating of the substrate (101) during C- CVD is controlled and deterioration by heating is avoided. The foil or substrate (101) is suitable, in particular, for use in flat and flexible displays.

Combustion chemical vapor deposition on temperature-sensitive substrates

The invention provides a system (10), a processing apparatus (30), a sample unit (20), a reagent unit (25) and a method for processing a biological sample inside the sample unit. The system comprises at least a processing apparatus and a sample unit, the sample unit comprises a plurality of microfluidic elements, the processing apparatus comprises actuation means capable of actuating at the microfluidic elements such that a quick, inexpensive and accurate analysis of the biological sample is possible.

System for Automatically Processing a Biological Sample

Method for depositing film on flexible (plastic/metal) foil and/or temperature sensitive substrates (101) by combustion chemical vapor deposition (C-CVD). A substrate (101) is held in place by suction to provide physical and thermal contact between the substrate (101) and a substrate holder (102) and, simultaneously, the substrate holder (102) is cooled using a cooling fluid and the substrate (101). Heating of the substrate (101) during C-CVD is controlled and deterioration by heating is avoided. The foil or substrate (101) is suitable, in particular, for use in flat and flexible displays.

Substrate temperature control for combustion chemical vapor deposition

A temperature regulation method and system (100) includes a reservoir (112) having a fluid with a temperature of a value such that, within a control range of a local temperature controller, a local set point temperature is achievable. A piping system (101) delivers the fluid from the reservoir to one or more elements needing temperature control. A heat generator/removal device (110) in one of the fluid paths is disposed at or near an element needing temperature control. For each heat generator/removal device, a local temperature controller (116) and a feedback sensor (114) are configured to control the heat generator/removal device such that an amount of heat exchanged with the fluid, at or near the element needing temperature control, results in a local temperature, monitored by the control feedback sensor to be locally and accurately maintained at the local set point temperature.

Local control of heat flow to more accurately regulate machine temperatures

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