Peter Kindersley
Applied Materials
16 Papers
309 Citations
Peter Kindersley is an academic researcher from Applied Materials. The author has contributed to research in topics: Ion beam & Beam (structure). The author has an hindex of 7, co-authored 16 publications.
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Papers
Patent
Ion implantation apparatus having increased source lifetime
Nicholas Bright,Paul Anthony Burfield,John Pontefract,Bernard Francis Harrison,Peter Meares,David Richard Burgin,Andrew Stephen Devaney,Peter Kindersley +7 more
- 20 Aug 1996
TL;DR: In this article, an ion implantation equipment is modified so as to provide filament reflectors to a filament inside of an arc chamber, and to remove the electrical insulators for the filament outside of the arc chamber and providing a means of shielding, thereby reducing the formation of a conductive layer on said insulators and greatly extending the lifetime and reducing downtime of the equipment.
83
Patent
Method of implanting a substrate and an ion implanter for performing the method
Adrian Murrell,Bernard Francis Harrison,Peter Edwards,Peter Kindersley,Craig John Lowrie,Peter Michael Banks,Takao Sakase,Marvin Farley,Shu Satoh,Geoffrey Ryding +9 more
- 04 May 2006
TL;DR: In this paper, the beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction.
64
Patent
Method of determining dose uniformity of a scanning ion implanter
D. Wagner,Biagio Gallo,Peter Kindersley,David Eugene Aberle,Jonathon Yancey Simmons +4 more
- 23 Jul 2004
TL;DR: In this article, the authors determined the dose uniformity of a scanning ion implanter by measuring the base beam current at a time when the measurement should be unaffected by outgassing from a substrate being implanted and then calculated a base dose distribution map.
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Patent
Ion beam monitoring arrangement
Adrian Murrell,Bernard Francis Harrison,Peter Edwards,Peter Kindersley,Robert John Clifford Mitchell,Theodore H. Smick,Geoffrey Ryding,Marvin Farley,Takao Sakase +8 more
- 05 Jan 2005
TL;DR: In this article, an ion beam monitoring arrangement for use in an ion implanter where it is desirable to monitor the flux and/or a cross-sectional profile of the ion beam used for implantation is presented.
41
Patent
Apparatus and method for improved scanning efficiency in an ion implanter
Peter Edwards,Christopher Wright,Peter Kindersley,Richard Cooke,Stephen Chamberlain +4 more
- 15 Sep 1997
TL;DR: An ion implanter for implanting ions into a substrate comprises an ion beam generator for generating a beam of ions, support means for carrying a substrate to be implanted with beam ions, scanning means for scanning at least one of the substrate and the ion beam relative to the other so that the beam traverses the substrate along a predetermined path as mentioned in this paper.
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