P.D. Foo
Nanyang Technological University
1 Papers
1 Citations
P.D. Foo is an academic researcher from Nanyang Technological University. The author has contributed to research in topics: Copper interconnect & Breakdown voltage. The author has an hindex of 1, co-authored 1 publications.
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Papers
Improving electrical performance of Cu/porous ultra-low k dielectrics single damascene lines
TL;DR: In this article, an additional dielectric barrier layer SiCN was deposited on the sidewalls prior to Ta(N) metal barrier deposition, and it was found that the leakage decreased with three to four orders of magnitude and breakdown voltage increased 200% compared with that without SiCN layer after burn-in at 200/spl deg/C for 40 h.
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