Oliver Kappertz
RWTH Aachen University
44 Papers
363 Citations
Oliver Kappertz is an academic researcher from RWTH Aachen University. The author has contributed to research in topics: Sputtering & Sputter deposition. The author has an hindex of 19, co-authored 43 publications. Previous affiliations of Oliver Kappertz include Uppsala University.
Chat about Author
Papers
Correlation between structure, stress and deposition parameters in direct current sputtered zinc oxide films
TL;DR: In this paper, the influence of oxygen flow and total pressure on film stress, structure, texture, and surface roughness has been examined, and the properties of the films strongly depend on the deposition conditions, in particular the total pressure.
110
Towards understanding the superior properties of transition metal oxynitrides prepared by reactive DC magnetron sputtering
Selvaraj Venkataraj,Daniel Severin,S. H. Mohamed,J.M. Ngaruiya,Oliver Kappertz,Matthias Wuttig +5 more
TL;DR: In this article, a simulation package was developed that reproduces the variation of the deposition rate, target voltage and film stoichiometry with reactive gas flow, and a scientific understanding was sought that explains both the film formation mechanism as well as the remarkable improvement in film properties.
102
Temperature stability of sputtered niobium–oxide films
TL;DR: In this paper, the effect of annealing temperature on the structural and optical properties of sputtered niobium-oxide films has been investigated by using Rutherford backscattering, X-ray diffraction, x-ray reflection, optical spectroscopy, and variable angle spectroscopic ellipsometry techniques.
93
Structure formation upon reactive direct current magnetron sputtering of transition metal oxide films
TL;DR: In this paper, a comparative study of reactive direct current magnetron sputtering for different transition metal oxides reveals crystalline films at room temperature for group 4 and amorphous films for groups 5 and 6 This observation cannot be explained by the known growth laws and is attributed to the impact of energetic particles originating from the oxidized target, on the growing film.
92
Dynamic Behaviour of the Reactive Sputtering Process
TL;DR: In this article, the influence of the processing parameters on the transient behavior of reactive sputtering is discussed and it is shown that the processing curves depend on the rate by which the processing parameter are varied.
81