We review the recent developments in the electric field control of magnetism in multiferroic heterostructures, which consist of heterogeneous materials systems where a magnetoelectric coupling is engineered between magnetic and ferroelectric components. The magnetoelectric coupling in these composite systems is interfacial in origin, and can arise from elastic strain, charge, and exchange bias interactions, with different characteristic responses and functionalities. Moreover, charge transport phenomena in multiferroic heterostructures, where both magnetic and ferroelectric order parameters are used to control charge transport, suggest new possibilities to control the conduction paths of the electron spin, with potential for device applications.

https://iopscience.iop.org/article/10.1088/0953-8984/24/33/333201/pdf

Electric field control of magnetism in multiferroic heterostructures

/pdf/electric-field-control-of-magnetism-in-multiferroic-1d70g5sjfm.pdf

The formation of a ½ monolayer (ML) of strontium (Sr) on Si(001) represents the most widely used and effective passivation procedure for the epitaxial growth of strontium titanate (SrTiO3) on Si with molecular beam epitaxy (MBE). In the present study, we demonstrate experimentally the possibility of preparing such a buffer layer with the pulsed-laser deposition (PLD) technique. In-situ analysis using reflection high-energy electron diffraction (RHEED) showed surface structure evolution from two-domain (2 × 1) + (1 × 2), exhibited by the bare silicon surface, to a (3 × 2) + (2 × 3) structure at 1/6 ML Sr coverage, which is then replaced by (1 × 2) + (2 × 1) structure at ¼ ML and maintained up to ½ ML coverage. In addition, two different processes for the removal of native silicon dioxide (SiO2) layer were studied: thermal and Sr-induced deoxidation process. Annealing above 1100 °C proved to be the most efficient in terms of carbon contamination. The results highlight the possibilities of using the PLD tech...

Formation of a strontium buffer layer on Si(001) by pulsed-laser deposition through the Sr/Si(001)(2 × 3) surface reconstruction

We investigate theoretically the oxidation stability of the Si(001) (2 × 1) reconstructed surface passivated by Sr. Using density functional theory, we find that the Sr surface with ½ monolayer of Sr is protected against oxidation. The presence of Sr delays the oxidation of the surface dimer, and even when the dimer is oxidized, O does not react with the back-bond, preventing the unwanted vertical growth of SiO2. We also show that ¼ monolayer of Sr protects the Si surface in a different way. In the presence of ¼ monolayer of Sr, O atoms are attracted to the Sr-Si dimer complexes, thus preventing the formation of SiO2.

Mechanism of oxidation protection of the Si(001) surface by sub-monolayer Sr template

An ordered alkaline-earth submonolayer on a clean $\mathrm{Si}(001)$ surface provides a template for growth of the atomically sharp, crystalline Si-oxide interface that is ubiquitous in the semiconductor device industry. It has been suggested that submonolayers of Sr or Ba on $\mathrm{Ge}(001)$ could play a similar role as on structurally identical $\mathrm{Si}(001)$, overcoming known limitations of the $\mathrm{Ge}(001)$ substrate such as amorphization of its oxidation layers. In this paper the initial stage of the Ba oxidation process, i.e., adsorption and organization of Ba atoms on the $\mathrm{Ge}(001)$ surface as a function of temperature $(270\ensuremath{-}770\phantom{\rule{0.16em}{0ex}}\mathrm{K})$ for coverage 1.0 monolayer (ML) and $0.15\ensuremath{-}0.4\phantom{\rule{0.16em}{0ex}}\mathrm{ML}$, is studied using scanning tunneling microscopy (STM) and density functional theory (DFT). Three types of features have been identified on the Ba-covered $\mathrm{Ge}(001)$ surface. They originate from isolated Ba adatoms, isolated Ba ad-dimers, and the Ba ad-dimers assembled into short-range, randomly distributed chains that run across the Ge dimer rows. We find from both STM measurements and DFT calculations that the latter is the dominant structure on $\mathrm{Ge}(001)$ with increasing coverage.

Initial growth of Ba on Ge (001 ) : An STM and DFT study

Phase transition of Sr on Si (0 0 1): First principles prediction and experiment

The Center for Research on Interface Structures and Phenomena (CRISP) is a National Science Foundation (NSF) Materials Research Science and Engineering Center (MRSEC). CRISP is a partnership between Yale University, Southern Connecticut State University (SCSU) and Brookhaven National Laboratory. A main focus of CRISP research is complex oxide interfaces that are prepared using epitaxial techniques, including molecular beam epitaxy (MBE). Complex oxides exhibit a wealth of electronic, magnetic and chemical behaviors, and the surfaces and interfaces of complex oxides can have properties that differ substantially from those of the corresponding bulk materials. CRISP employs this research program in a concerted way to educate students at all levels. CRISP has constructed a robust MBE apparatus specifically designed for safe and productive use by undergraduates. Students can grow their own samples and then characterize them with facilities at both Yale and SCSU, providing a complete research and educational experience. This paper will focus on the implementation of the CRISP Teaching MBE facility and its use in the study of the synthesis and properties of the crystalline oxide-silicon interface.

https://www.cambridge.org/core/services/aop-cambridge-core/content/view/S1946427400020698

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Phase transition of Sr on Si (0 0 1): First principles prediction and experiment

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