Markus Schinnerl
Vienna University of Technology
11 Papers
24 Citations
Markus Schinnerl is an academic researcher from Vienna University of Technology. The author has contributed to research in topics: Electron beam-induced deposition & Focused ion beam. The author has an hindex of 6, co-authored 11 publications.
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Papers
Electron Beam-Induced CVD of Nanoalloys for Nanoelectronics†
Mostafa M. Shawrav,Domagoj Belić,Marco Gavagnin,Stefan Wachter,Markus Schinnerl,Heinz D. Wanzenboeck,Emmerich Bertagnolli +6 more
TL;DR: In this article, the first successful achievement of Au-Fe nanoalloys using focused electron beam-induced deposition (FEBID) exploiting the possibility of directly writing nanostructures at nanometer resolution is reported.
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Mask‐free prototyping of metal‐oxide‐semiconductor devices utilizing focused electron beam induced deposition
Mostafa M. Shawrav,Heinz D. Wanzenboeck,Domagoj Belić,Marco Gavagnin,Ole Bethge,Markus Schinnerl,Emmerich Bertagnolli +6 more
TL;DR: In this article, focused electron beam induced deposition (FEBID) was employed for the first time to fabricate metal-oxide-semiconductor capacitors (MOSCAPs).
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Mastering of NIL Stamps with Undercut T-Shaped Features from Single Layer to Multilayer Stamps
Philipp Taus,Adrian Prinz,Heinz D. Wanzenboeck,Patrick Schuller,Anton Tsenov,Markus Schinnerl,Mostafa M. Shawrav,Michael J. Haslinger,Michael Muehlberger +8 more
TL;DR: In this article, a single-layer undercut T-shaped structure was constructed using phase transition material (PTM) on poly-Si and a multilayer-stack of silicon oxide on silicon.
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Analysis of carbon content in direct-write plasmonic Au structures by nanomechanical scanning absorption microscopy.
Miao-Hsuan Chien,Mostafa M. Shawrav,Kurt Hingerl,Philipp Taus,Markus Schinnerl,Heinz D. Wanzenboeck,Silvan Schmid +6 more
TL;DR: In this paper, the authors proposed an alternative technique for measuring chemical composition of nanostructures with limited volume by measuring the differences in the optical absorption of the nanostructure due to the difference in the chemical composition with the resonance frequency detuning of a nanomechanical resonator.
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Optimized plasma-assisted bi-layer photoresist fabrication protocol for high resolution microfabrication of thin-film metal electrodes on porous polymer membranes.
Patrick Schuller,Mario Rothbauer,Christoph Eilenberger,Sebastian R.A. Kratz,Gregor Höll,Philipp Taus,Markus Schinnerl,Jakob Genser,Peter Ertl,Heinz D. Wanzenboeck +9 more
TL;DR: In this paper, a bi-layer lift-off method was proposed for thin-film fabrication on commercial porous polyester membranes using a combination of LOR3A with AZ5214E photoresists.
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