M. Witthaut
RWTH Aachen University
13 Papers
131 Citations
M. Witthaut is an academic researcher from RWTH Aachen University. The author has contributed to research in topics: X-ray photoelectron spectroscopy & Thin film. The author has an hindex of 10, co-authored 13 publications.
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Papers
Comparative characterization of alumina coatings deposited by RF, DC and pulsed reactive magnetron sputtering
TL;DR: In this paper, the influence of deposition temperature and sputtering conditions upon the crystal structure of the films has been investigated by X-ray diffraction, the hardness by microindentation, and a correlation between film growth rate and oxygen partial pressure has been determined.
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Thermal stability of Al-O-N PVD diffusion barriers
TL;DR: In this paper, the use of Al-O-N films as a diffusion barrier for components with a high thermal load, e.g. in gas turbines, was investigated, and the phase stability of the films was examined by annealing under inert atmosphere at temperatures up to 1473 K for 4 h and subsequent XRD analyses.
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Preparation of Cr2O3-Al2O3 solid solutions by reactive magnetron sputtering
TL;DR: In this article, the influence of the Al and Cr sputter power and of the oxygen partial pressure on composition and structure of the (Al,Cr)2O3 layers as well as on the binding states of their components were investigated.
61
Composition, binding states, structure, and morphology of the corrosion layer of an oxidized Ti0.46Al0.54N film
TL;DR: In this article, a metastable, single-phase, polycrystalline Ti0.46Al0.54N film was deposited on a HSS substrate by reactive magnetron sputtering ion plating and oxidized in synthetic air at 800°C.
31
Improvement of the oxidation behavior of Ti1-xAlxN hard coatings by optimization of the Ti/Al ratio
TL;DR: In this paper, a polycrystalline, single-phase Ti 1-x Al x N films were deposited on high speed steel (HSS) substrates by reactive magnetron sputtering ion plating (MSIP).
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