Cu3N films prepared by the low-pressure r.f. supersonic plasma jet reactor: Structure and optical properties

A low pressure pulsed RF supersonic plasma jet system (RPJ) has been used for deposition of CN x thin films. The aim of the CN x thin films deposition was an application for tribological coatings. Chemical composition, mechanical and optical properties of deposited CN x films have been measured. The obtained parameters were found to be similar to those of CN x films prepared by DC magnetron sputtering. The deposition rate for the CN x films prepared in RPJ reactor was of approximately 2 μm/h. During the deposition process, the substrate temperature did not exceed 250°C, as required for certain kinds of machine tribological coatings. A strong correlation between DC bias magnitude, nitrogen concentration and mechanical properties was found. The value of the substrate bias V DC =−100 V was found to be optimal for deposition of hard CN x films with maximum microhardness H =22 GPa. The films with the highest microhardness had the lowest atomic concentration of nitrogen. Analogous correlation has been found in ‘Diamond Relat. Mater. 7 (1998) 417’, although the deposition method and conditions were quite different. The chemically active plasma has been investigated in the RF supersonic plasma jet channel during the deposition process by means of ‘in situ’ emission spectroscopy. The mechanism of CN x formation has been studied as well.

CNx coatings deposited by pulsed RF supersonic plasma jet : hardness, nitrogenation and optical properties

The distribution of TiO2 nanoparticles in a plasma plume of a hollow cathode plasma jet is being studied in this work. The method is based on the detection of light from a laser beam scattered on nanoparticles by three detectors: a photodiode, an optical spectrometer and a digital photo camera. The Rayleigh–Mie theory was used as a basis for the description of the results. Two lasers with wavelengths of 446 and 661 nm were used as light sources. 2D maps of the scattered light intensity were assembled from photo camera pictures at different discharge parameters. Dependencies of the signal intensity on the O2 flow rate and wavelength are discussed. Direct measurements of particle size on the substrate were carried out by means of a scanning electron microscope in order to verify the agreement of results with the theory. Aside from nanoparticles we detected TiO2 columnar structures in the deposited samples. Crystalline structure of the samples was investigated using x-ray diffraction analysis.

https://iopscience.iop.org/article/10.1088/0022-3727/49/26/265201/pdf

TiO2 nanoparticle detection by means of laser beam scattering in a hollow cathode plasma jet

A plasma-chemical reactor with a multi-plasma-jet RF hollow-cathode system has been developed for the deposition of alloy and composite thin films. Two primary plasma-jet channels and one secondary plasma channel were created in the volume of the reactor. High-density plasma flowing in these plasma-jet channels is generated inside the nozzles. These work simultaneously as RF hollow cathodes. An RF hollow cathode discharge is generated in these nozzles and is subsequently blown out of the reactor, creating flowing plasma jets. These jets were used for the deposition of SiGe and ZrCN thin films as an example of the deposition of alloy and composite thin films with this system. Co-sputtering or reactive co-sputtering of the nozzle material using high-density RF hollow-cathode plasma was applied for the deposition process. Control of the composition of the thin films was accomplished by setting the relative distance between the nozzle outlets without changing the plasma density inside the RF hollow cathodes. The composition of films was investigated with an electron microprobe system equipped with an X-ray microanalyser. This apparatus allowed quantitative analysis of the films. The stoichiometric homogeneity of the films was studied with this technique. Optical emission spectroscopy was used to investigate the secondary plasma-jet channel.

Low-pressure RF multi-plasma-jet system for deposition of alloy and composite thin films

WO3 and WO3-x thin films prepared by DC hollow cathode discharge

Although the plasma-chemical processes and properties of the deposited thin film can strongly depend on the interaction of the supersonic plasma jet channel with the substrate, up to now the study of this phenomenon has not yet been done. We decided to study this interaction by means of CCD camera. The presented results indicate that the light intensity recorded close to the substrate can be used as a measure of the intensity of plasma-chemical deposition processes on the substrate surface.

The Interaction of the Supersonic Plasma‐Jet with the Substrate in the RF Plasma‐Chemical Reactor

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The Interaction of the Supersonic Plasma‐Jet with the Substrate in the RF Plasma‐Chemical Reactor