M. Mehran
Shahid Bahonar University of Kerman
31 Papers
151 Citations
M. Mehran is an academic researcher from Shahid Bahonar University of Kerman. The author has contributed to research in topics: Silicon & Reactive-ion etching. The author has an hindex of 9, co-authored 27 publications. Previous affiliations of M. Mehran include University of Tehran.
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Papers
Fabrication of sensitive glutamate biosensor based on vertically aligned CNT nanoelectrode array and investigating the effect of CNTs density on the electrode performance.
Azam Gholizadeh,Saeed Shahrokhian,Azam Iraji zad,Shamsoddin Mohajerzadeh,Manouchehr Vosoughi,Sara Darbari,Javad Koohsorkhi,M. Mehran +7 more
TL;DR: The results prove the efficacy of the fabricated VACNT-NEA for low cost and highly sensitive enzymatic biosensor with high sensitivity well suited for voltammetric detection of a wide range of clinically important biomarkers.
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Dual mode operation, highly selective nanohole array-based plasmonic colour filters.
TL;DR: This paper presents dual mode operation PCFs employing an opaque aluminium film patterned with sub-wavelength holes employing a relatively thick aluminium film in contact with a modified dielectric environment and provides a simple design with one-step lithography in addition to compatibility with the conventional CMOS processes.
31
•Journal Article
Novel Subtractor Design Based on Quantum-Dot Cellular Automata (QCA) Nanotechnology
H. Dallaki,M. Mehran +1 more
TL;DR: In this article, a new architecture of half and full subtractor based on the Quantum-dot cellular automaton (QCA) is proposed, which takes advantage of optimal XOR gate in designing these arithmetic units.
28
Nanograss and nanostructure formation on silicon using a modified deep reactive ion etching
TL;DR: In this article, a modified deep reactive ion etching technique was used on both plane and vertical surfaces of a silicon substrate to achieve grassless high aspect ratio features as well as grass-full surfaces.
28
Formation of three-dimensional and nanowall structures on silicon using a hydrogen-assisted high aspect ratio etching
TL;DR: In this article, a hydrogen-assisted deep reactive ion etching process was used to achieve high aspect ratio features on silicon substrates with a single masking layer using a single-layer masking.
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