The present invention relates to a delivery system for vaporizing and delivering vaporized solid and liquid precursor materials at a controlled rate having particular utility for semiconductor manufacturing applications. The system includes a vaporization vessel, a processing tool and a connecting vapor line therebetween, where the system further includes an input flow controller and/or an output flow controller to provide a controlled delivery of a vaporizable source material to the vaporization vessel and a controlled flow rate of vaporized source material to the processing tool.

Delivery systems for efficient vaporization of precursor source material

PROBLEM TO BE SOLVED: To reduce the noise by stabilizing a flow of a refrigerant with a valve port in a motor-operated valve for controlling a flow rate of the refrigerant by opening/closing the valve port with a needle valve.SOLUTION: A valve seat part 1 is formed with a first valve port 11 having a circular cross section and an inner diameter D1, and a second valve port 12 having a circular cross section and an inner diameter D2. The inner diameter D1 and the inner diameter D2 are set to satisfy formula D1<D2<D3 relative to an inner diameter D3 of a secondary connector pipe 42. A tapered part 13 is provided between the first valve port 11 and the second valve port 12. An angle (α1) formed by the inside surfaces of the tapered part 13 is set within a range of 5°≤α1≤30°. The inside surface of the second valve port 12 is formed into a straight cylindrical shape relative to the tapered part 13. Before the refrigerant, which has passed through a gap with the needle valve 51, reaches the second connector pipe 42 through the tapered part 13, the flow speed is reduced in the second valve port 12. Further, with this structure provided with the straight second valve port 12, outbreaks of a free shearing surface in the refrigerant on the secondary joint pipe 42 side are restricted to stabilize the flow before the refrigerant reaches the second connector pipe 42.

Motor operated valve

Methods and apparatuses for separately injecting gases into a reactor for a substrate processing system. The flow profiles of the gases are controlled with two or more sets of adjustable gas flow injectors. The methods are particularly useful for selective deposition of gases in a CVD system using volatile combinations of precursors and etchants. In either case, the gases are provided along separate flow paths that intersect in a relatively open reaction space, rather than in more confined upstream locations.

Substrate reactor with adjustable injectors for mixing gases within reaction chamber

A gas mixing valve has first and second inlet chambers linked to supplies of a first and second gas, and a mixing chamber having a blended gas outlet. The inlet chambers are connected to the mixing chamber via first and second control valves, each valve having a valve seat and valve member with opposing surfaces defining a flow control orifice. Each valve seat and valve member are relatively movable between a closed position in which no flow occurs and a maximum opening position to define a series of orifices of progressively increasing area corresponding to the same geometrical progression. The position of each valve member can be controlled to provide a desired mixing ratio. Each valve seat is provided in a respective piston, and the pistons are tied together to move in response to variations in pressure drop across each piston, in order to vary the orifice size to compensate for changes in flow rate without changing the mixing ratio.

Gas mixing apparatus for respirator

A fluid storage and dispensing system (10) comprising a vessel (12) for holding a fluid (17) at a desired pressure. The vessel has a pressure regulator (26) set at a predetermined pressure. The regulator may be interiorly or exteriorly positioned, single-staged or multi-staged, and is associated with a port of the vessel. A dispensing assembly, e.g., including a flow control means such as a valve (20), is arranged in gas/vapor flow communication with the regulator (26), whereby the opening of the valve effects dispensing of gas/vapor from the vessel (12). The fluid in the vessel may be constituted by a liquid that is confined in the vessel at a pressure in excess of its liquefaction pressure at prevailing temperature conditions, e.g., ambient (room) temperature.

Fluid storage and dispensing system

An apparatus free of polymer material in contact with process gas for delivering process gas for making semiconductors includes a pressure regulator for regulating the pressure of the process gas to be delivered by the apparatus from a supply of pressurized process gas. The pressure regulator has a first valve seat and a first valve which cooperates with the first valve seat for controlling the flow of process gas through the regulator. Both the first valve seat and the first valve are formed of metal. The apparatus further includes a second valve having metal-to-metal dynamic seating for controlling the flow of the gas from the supply to the regulator. The second valve is provided immediately upstream of the pressure regulator along a flow path for the gas through the apparatus. A relatively high creep of the pressure regulator is significantly reduced by operating the regulator in conjunction with the pneumatically operated (on/off) second valve.

Apparatus for delivering process gas for making semiconductors and method of using same

A valve having metal-to-metal dynamic seating for controlling the flow of gas includes a valve body having a gas passage extending therethrough, a metal seat extending about the gas passage, a flexible metal diaphragm mounted in the valve so the diaphragm can be moved into and out of sealing contact with the metal seat to respectively close and open the gas passage, and an actuator operable for opening and closing the gas passage by way of movement of the diaphragm relative to the metal seat. The actuator includes a metal backing member forcedly contacting the diaphragm during closing of the gas passage on a side of the diaphragm opposite a side thereof which makes sealing contact with the metal seat. The metal seat and the metal backing member are configured such that the sealing contact between the metal diaphragm and the metal seat is a relatively narrow line of contact extending about the gas passage. The metal seat is formed of a relatively soft metal and each of the metal diaphragm and metal backing member is formed of a relatively hard metal for attaining near absolute closure by the valve without the use of plastics or elastomers in contact with the gas.

Valve having metal-to metal dynamic seating for controlling the flow of gas for making semiconductors

1,250,395. Respiratory appliances. VERIFLO CORP. 23 Jan., 1969 [18 March, 1968], No. 3872/69. Heading AST. [Also in Divisions B1, F2 and G3] In an apparatus for mixing gases (e.g. oxygen and air) in any rate and supplying the mixture according to instantaneous demand, the gases enter at substantially equal pressures through conduits 100, 103 and 110, 112 to a ratio setter 23 (see also Fig. 8, not shown, and Division G3) comprising respective needle valves 82, 81 geared together to operate in complementary senses whereby any ratio of the gases may be obtained. The gases then pass by conduits 105, 114 to respective flow controllers 20, 21 (see also Figs. 2-5, not shown and Division F2) having valve controlled outlets 48, 58 and thence to the mixture outlet conduit 115. The flow controller outlet valves are actuated by diaphragm assemblies in dependence on the pressures in chambers 34, 54, which are in turn dependent on pneumatic control and signals from the pressure controller 22 (see also Figs. 5 and 6, not shown, and Division). This has a venturiform pressure gas inlet 77, 78 whereby a reduced pressure is created in passage 67, 80 and transmitted by conduit 118 to the chambers 34, 54 in the flow controllers, causing the outlet valves thereof to close. If there is a demand in the outlet conduit 115, the pressure therein and in the conduit 117 and chamber 74 of the pressure controller will fall, the valve 79 will dose and the venturi effect will cease, so that pressure in the conduit 118 and chambers 34, 54 will rise, causing the outlet valves of the flow controllers to open. The pressure in the outlet conduit may be raised by adjustment of the compression of the spring 76 in the pressure controller.

Ratio controller for gases

A cylinder valve for mounting on a high pressure gas cylinder for remotely controlling the flow of gas from the cylinder. The cylinder valve is resistant to hazardous gases and includes a fluid passage for conveying gas through the cylinder valve from an inlet for communicating with the high pressure gas cylinder to an outlet. A first valve is provided for opening and closing the fluid passage to control the flow of gas through the fluid passage. A pneumatically operated actuator is provided for operating the first valve in response to the application of an external control pressure to the actuator. A mechanism is provided to move the first valve and close the fluid passage in the event of loss of external control pressure to the actuator. A second valve is located downstream of the first valve in the vicinity of the outlet. The second valve is biased to close the fluid passage but is moved to open the passage in response to attachment of a connector to the outlet of the cylinder valve. A one-way restrictor is provided in the fluid passage between the second valve and the outlet for restricting the flow of gas flowing in the fluid passage in a direction of the outlet. A pressure safety device is also provided in fluid communication with the fluid passage of the cylinder valve for releasing gas pressure above a safe operating temperature and/or pressure.

Cylinder valve-regulator

An improved continuously variable micro control valve and an apparatus and a method employing the same for making semiconductors enable a computer to precisely set a driver of the micro control valve such that the accuracy of the control valve in reproducing a flow value for a given setting of the driver is at least 1/1000 of a maximum flow value for a relatively wide range of flow values which can be provided by the micro control valve. The relatively wide range of flow values is at least 1000 to 1 in a disclosed embodiment with a resolution sensitivity of the micro control valve being at least 1/10,000 of the full scale of the relatively wide range of flow values. The improvement in repeatability and accuracy afforded by the micro control valve can result in higher yields in semiconductor making.

Micro control valve and apparatus and method for making semiconductors with high purity process gas

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