19 Papers
56 Citations
Liping Dai is an academic researcher from University of Electronic Science and Technology of China. The author has contributed to research in topics: Thin film & X-ray photoelectron spectroscopy. The author has an hindex of 7, co-authored 18 publications.
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Papers
Properties of Al heavy-doped ZnO thin films by RF magnetron sputtering
TL;DR: In this article, X-ray diffraction and scanning electron spectrometer studies, wurtzite structure with (0-0-2) orientation ZnO thin films were obtained at Al concentration below 15 atomic percent (at%).
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The recent advances of research on p-type ZnO thin film
TL;DR: In this article, the authors summarized the recent advances of the studies on p-type ZnO thin film and the correlative several important breakthroughs in znO homo-junction devices based on succeeding on fabrication of p-Type ZNO film.
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Realization of the intrinsic p-type ZnO thin film by SSCVD
TL;DR: The p-type ZnO thin films were first fabricated on silicon(100) substrate by a single source chemical vapor deposition technique, and characterized by the Hall measurements.
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Ultraviolet emission properties of ZnO film with zinc deficiency by SS CVD
TL;DR: In this paper, a temperature-dependent (10 −300 K) ultraviolet photoluminescence of a ZnO film on silicon (1 −0 −0) substrate has been presented.
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Etching mechanism of barium strontium titanate (BST) thin films in CHF3/Ar plasma
TL;DR: In this paper, a reaction ion etching was used to etch barium strontium titanate thin films in a CHF3/Ar plasma, and a 1-min Ar/15 plasma physical sputtering was carried out for every 4 min of surface etching, which effectively removed remaining surface residue.
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