Ling Liu
Chinese Academy of Sciences
17 Papers
69 Citations
Ling Liu is an academic researcher from Chinese Academy of Sciences. The author has contributed to research in topics: Etching (microfabrication) & Photoresist. The author has an hindex of 6, co-authored 17 publications.
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Papers
Improved near field lithography by surface plasmon resonance in groove-patterned masks
TL;DR: In this paper, the authors proposed to use appropriately designed groove structures around subwavelength metallic slits to solve the problem of optical transmission through isolated sub-wavelength apertures.
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Launching deep subwavelength bulk plasmon polaritons through hyperbolic metamaterials for surface imaging with a tuneable ultra-short illumination depth.
TL;DR: Hyperbolic metamaterials composed of multiple nanometal-dielectric films are proposed for launching deep subwavelength bulk plasmon polaritons (BPPs) as uniform, large area surface imaging illumination sources with a skin depth even beyond 10 nm.
10
Patent
Silicon mask used for super-diffraction photoetching with line width of below 200 nanometers and manufacturing method thereof
Liang Fang,Kaipeng Liu,Ling Liu,Yao Liu,Xiangang Luo,Li Pan,Changtao Wang,Hui Xing +7 more
- 09 Jun 2010
TL;DR: In this paper, a silicon mask for super-diffraction photoetching with line width of less than 200 nanometers and a manufacturing method of the mask using a silicon film on an ultraviolet transparent material substrate as a graph layer is described.
8
Patent
Method for preparing semicylindrical minute groove by utilizing secondary film deposition and wet etching
Qin Feng,Kaipeng Liu,Ling Liu,Yao Liu,Xiangang Luo,Li Pan,Changtao Wang,Hui Xing +7 more
- 09 Jun 2010
TL;DR: In this paper, a method for preparing a semicylindrical minute groove by utilizing two-time film deposition and wet etching, which comprises the following steps of: depositing a film on a quartz substrate by adopting a conventional technology, coating a photoresist on the film, photoetching, developing and firming a mould; using a photoregressive graph for shielding and isotropical characteristics of wet etch and using an etching solution to etch the film below the edge of the photoresists graph to form an air gap with certain width.
7
Patent
Reflective surface plasma imaging and photo-etching method for processing nano graph with high depth-to-width ratio
Liang Fang,Qin Feng,Ling Liu,Yao Liu,Xiangang Luo,Li Pan,Changtao Wang,Hui Xing +7 more
- 09 Jun 2010
TL;DR: In this paper, a photoresist-silver membrane-photoresist three-layer membrane structural substrate is adopted, and contact exposure is carried out on a nano mask figure surface and substrate surface layer photoresists.
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