L. Van Look
IMEC
7 Papers
56 Citations
L. Van Look is an academic researcher from IMEC. The author has contributed to research in topics: Photolithography & Reticle. The author has an hindex of 5, co-authored 7 publications.
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Papers
Printing the metal and contact layers for the 32- and 22-nm node: comparing positive and negative tone development process
L. Van Look,Joost Bekaert,Vincent Truffert,Vincent Wiaux,Frederic Lazzarino,Mireille Maenhoudt,Geert Vandenberghe,Mario Reybrouck,Shinji Tarutani +8 more
TL;DR: In this article, the negative tone development (NTD) was used for the printing of contacts and trenches in a FUJIFILM solvent-based developer, and the NTD was evaluated on an ASML Twinscan XT:1900i scanner.
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Freeform illumination sources: An experimental study of source-mask optimization for 22 nm SRAM cells
Joost Bekaert,Bart Laenens,Staf Verhaegen,L. Van Look,Darko Trivkovic,Frederic Lazzarino,Geert Vandenberghe,P. van Adrichem,Robert John Socha,Stanislas Baron,Min-Chun Tsai,K. Ning,Stephen Hsu,Hua-yu Liu,Melchior Mulder,Anita Bouma,E. van der Heijden,Orion Mouraille,Kram Koen Schreel,Jozef Maria Finders,Mircea Dusa,Joerg Zimmermann,Paul Gräupner,J. T. Neumann,Christoph Hennerkes +24 more
TL;DR: In this article, the benefit of freeform over traditional illumination is evaluated by applying source mask co-optimization for an aggressive use case, and wafer-based verification, for a 22 nm node SRAM of 0.099 μm² and 0.078 μm 2 ======bit cell area.
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Tool-to-tool optical proximity effect matching
L. Van Look,Joost Bekaert,Peter De Bisschop,Jeroen Van de Kerkhove,Geert Vandenberghe,Koen Schreel,Jasper Menger,Guido Schiffelers,Edwin Wilhelmus Marie Knols,Rob Willekers +9 more
TL;DR: This paper reports on the matching strategy that was developed to perform a tool-to-tool matching and presents experimental matching results for several tool combinations at numerical apertures 0.75, 0.85 and 1.2.
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Characterization and control of dynamic lens heating effects under high volume manufacturing conditions
Joost Bekaert,L. Van Look,Geert Vandenberghe,P. van Adrichem,Mark John Maslow,Jan-Willem Gemmink,Hua Cao,Stefan Hunsche,J. T. Neumann,A. Wolf +9 more
TL;DR: The performance of the novel computational lens heating control is demonstrated on wafer and compared with the traditional way of measuring the relevant parameters, thereby demonstrating the advanced correction potential of ASML latest aberration manipulator, called FlexWaveTM.
21
Scanner matching for standard and freeform illumination shapes using FlexRay
Joost Bekaert,L. Van Look,Koen D'havé,Bart Laenens,Geert Vandenberghe,P. van Adrichem,Wenjin Shao,Justin Ghan,Koen Schreel,J. T. Neumann +9 more
TL;DR: This paper demonstrates how the upgrade of an exposure tool from Aerial to FlexRay illuminator shows identical proximity behavior without any need for scanner tuning, and the application of FlexRay source tuning is demonstrated.
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