Kenneth J. McCullough

TL;DR: In this paper, an apparatus for cleaning a workpiece with a cleaning medium that is maintained at a single fluid phase is presented. But the workpiece is not maintained at the same phase as the cleaning medium.

TL;DR: In this article, a method and an apparatus, the apparatus including appropriate valves and conduits, for increasing throughput in pressurized fluid processing including storing in a storage chamber of the apparatus a quantity of fluid at a pressure higher than a pressure at which an operation is to take place, while a processing chamber is depressurized to allow reception of a new object; sealing the processing chamber; and allowing fluid stored in the storage chamber to pass to the processing container to re-pressurize the chamber before performing the operation.

TL;DR: Silylation of object surfaces using a mixture of a silylation agent in admixture with an inert liquified gas, such as carbon dioxide, was studied in this article.

TL;DR: In this paper, a process of removing residual slurry resulting from chemical mechanical polishing of a workpiece was described, in which the workpiece is contacted with a composition of a supercritical fluid, including supercritical, carbon dioxide and a co-solvent, and a surfactant.