Karthik Sridhara
Texas A&M University
9 Papers
663 Citations
Karthik Sridhara is an academic researcher from Texas A&M University. The author has contributed to research in topics: Graphene & Contact resistance. The author has an hindex of 7, co-authored 9 publications. Previous affiliations of Karthik Sridhara include United States Naval Research Laboratory & University of Maryland, College Park.
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Papers
High Mobility Ambipolar MoS2 Field-Effect Transistors: Substrate and Dielectric Effects
TL;DR: In this paper, the authors fabricate MoS2 field effect transistors on both SiO2 and polymethyl methacrylate (PMMA) dielectrics and measure charge carrier mobility in a four-probe configuration.
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High mobility ambipolar MoS2 field-effect transistors: Substrate and dielectric effects
TL;DR: In this paper, the authors fabricate MoS2 field effect transistors on both SiO2 and polymethyl methacrylate (PMMA) dielectrics and measure charge carrier mobility in a four-probe configuration.
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Growth and spectroscopic characterization of monolayer and few-layer hexagonal boron nitride on metal substrates
Boris N. Feigelson,Victor M. Bermudez,Jennifer K. Hite,Zachary R. Robinson,Virginia D. Wheeler,Karthik Sridhara,Karthik Sridhara,Sandra C. Hernández +7 more
TL;DR: A new approach to characterizing monolayer h-BN films directly on metal substrates by grazing-incidence infrared reflection absorption spectroscopy (IRRAS) is demonstrated and two new sub-bands are found for the A2u out-of-plane stretching mode.
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Plasma-based chemical modification of epitaxial graphene with oxygen functionalities
Sandra C. Hernández,Virginia D. Wheeler,Michael Osofsky,Glenn G. Jernigan,V. K. Nagareddy,Anindya Nath,Evgeniya H. Lock,Luke O. Nyakiti,Rachael L. Myers-Ward,Karthik Sridhara,A.B. Horsfall,C. R. Eddy,D. K. Gaskill,Scott G. Walton +13 more
TL;DR: In this paper, the use of electron beam generated plasmas as a route towards controlled oxygen doping of epitaxial graphene has been demonstrated for high frequency devices and chemical/biological sensors.
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In search of quantum-limited contact resistance: understanding the intrinsic and extrinsic effects on the graphene–metal interface
Anindya Nath,Anindya Nath,Marc Currie,Anthony K. Boyd,Virginia D. Wheeler,Andrew D. Koehler,Marko J. Tadjer,Zachary R. Robinson,Karthik Sridhara,Sandra C. Hernández,James A. Wollmershauser,Jeremy T. Robinson,Rachael L. Myers-Ward,Mulpuri V. Rao,D. Kurt Gaskill +14 more
- 13 Apr 2016
Abstract: Owing to its two-dimensional structure, graphene is extremely sensitive to surface contamination. Conventional processing techniques inevitably modify graphene’s intrinsic properties by introducing adsorbents and/or defects which limit device performance and understanding the intrinsic properties of graphene. Here we demonstrate femtosecond laser direct patterning of graphene microstructures, without the aid of resists or other chemicals, that enables us to study both intrinsic and extrinsic effects on the graphene–metal interface. The pulsed femtosecond laser was configured to ablate epitaxial graphene (EG) on a sub-micrometer scale and form a precisely defined region without damaging the surrounding material or substrate. The ablated area was sufficient to electrically isolate transfer length measurement structures and Hall devices for subsequent transport measurements. Using pristine and systematically contaminated surfaces, we found that Ni does not form bonds to EG synthesized on SiC in contrast to the well-known C–Ni bond formation for graphene synthesized on metals; known as end-contacting. Without end-contacting, the contact resistance (RC) of Ni to pristine and resist-contaminated EG are one and two orders of magnitude larger, respectively, than the intrinsic quantum limited contact resistance. The range of reported RC values is explained using carrier transmission probability, as exemplified by the Landauer–Büttiker model, which is dependent on the presence or absence of end-contacts and dopant/work-function mediated conduction. The model predicts the need for both end-contacts and a clean graphene–metal interface as necessary conditions to approach quantum limited contact resistance.
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