K. Sharma
Lam Research
36 Papers
162 Citations
K. Sharma is an academic researcher from Lam Research. The author has contributed to research in topics: Amorphous silicon & Chemistry. The author has an hindex of 11, co-authored 25 publications. Previous affiliations of K. Sharma include Eindhoven University of Technology.
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Papers
Spatial atomic layer deposition on flexible substrates using a modular rotating cylinder reactor
TL;DR: In this paper, the authors present results for spatial atomic layer deposition (ALD) on flexible substrates using a modular rotating cylinder reactor, where the inner cylinder rotates with the flexible substrate and passes underneath the spatially separated slits in the outer cylinder.
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Optical modeling of plasma-deposited ZnO films: Electron scattering at different length scales
Harm C. M. Knoops,Bas W. H. van de Loo,Sjoerd Smit,M. V. Ponomarev,JW Jan-Willem Weber,K. Sharma,Wilhelmus M. M. Kessels,Mariadriana Creatore +7 more
TL;DR: In this article, an optical modeling study on electron scattering mechanisms in plasma-deposited ZnO layers is presented, where the Drude oscillator is adopted to represent the free-electron contribution and the obtained optical mobility can be then correlated with the macroscopic material properties.
Spatial atomic layer deposition on flexible porous substrates: ZnO on anodic aluminum oxide films and Al2O3 on Li ion battery electrodes
TL;DR: Spatial atomic layer deposition (S-ALD) was examined on flexible porous substrates utilizing a rotating cylinder reactor to perform the S-ALD as discussed by the authors, which was first explored on flexible polyethylene terephthalate polymer substrates to obtain SALD growth rates on flat surfaces.
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Novel approach to thin film polycrystalline silicon on glass
TL;DR: In this paper, polycrystalline silicon (poly-Si) films have been deposited on glass at high deposition rate (8nm/s) and high substrate temperature (400°C) by the expanding thermal plasma technique (ETP).
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On the effect of the amorphous silicon microstructure on the grain size of solid phase crystallized polycrystalline silicon
K. Sharma,A Annalisa Branca,Andrea Illiberi,Frans D. Tichelaar,Mariadriana Creatore,Mauritius C. M. van de Sanden +5 more
TL;DR: In this paper, the effect of the microstructure of remote plasma-deposited amorphous silicon films on the grain size development in polycrystalline silicon upon solid-phase crystallization is reported.
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