An object is to provide a semiconductor device of which a manufacturing process is not complicated and by which cost can be suppressed, by forming a thin film transistor using an oxide semiconductor film typified by zinc oxide, and a manufacturing method thereof. For the semiconductor device, a gate electrode is formed over a substrate; a gate insulating film is formed covering the gate electrode; an oxide semiconductor film is formed over the gate insulating film; and a first conductive film and a second conductive film are formed over the oxide semiconductor film. The oxide semiconductor film has at least a crystallized region in a channel region.

Semiconductor device, and manufacturing method thereof

Atomic layer deposition (ALD) is gaining attention as a thin film deposition method, uniquely suitable for depositing uniform and conformal films on complex three-dimensional topographies. The deposition of a film of a given material by ALD relies on the successive, separated, and self-terminating gas–solid reactions of typically two gaseous reactants. Hundreds of ALD chemistries have been found for depositing a variety of materials during the past decades, mostly for inorganic materials but lately also for organic and inorganic–organic hybrid compounds. One factor that often dictates the properties of ALD films in actual applications is the crystallinity of the grown film: Is the material amorphous or, if it is crystalline, which phase(s) is (are) present. In this thematic review, we first describe the basics of ALD, summarize the two-reactant ALD processes to grow inorganic materials developed to-date, updating the information of an earlier review on ALD [R. L. Puurunen, J. Appl. Phys. 97, 121301 (2005)], and give an overview of the status of processing ternary compounds by ALD. We then proceed to analyze the published experimental data for information on the crystallinity and phase of inorganic materials deposited by ALD from different reactants at different temperatures. The data are collected for films in their as-deposited state and tabulated for easy reference. Case studies are presented to illustrate the effect of different process parameters on crystallinity for representative materials: aluminium oxide, zirconium oxide, zinc oxide, titanium nitride, zinc zulfide, and ruthenium. Finally, we discuss the general trends in the development of film crystallinity as function of ALD process parameters. The authors hope that this review will help newcomers to ALD to familiarize themselves with the complex world of crystalline ALD films and, at the same time, serve for the expert as a handbook-type reference source on ALD processes and film crystallinity.

Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends

Various mechanisms for the Fermi level pinning of p-gate metals on HfO2 are analyzed in detail. It is found that for Fermi energies below the Si valence band, HfO2 can oxidize Si by creating positively charged O vacancies. The band bending due to this vacancy concentration can account for the observed Fermi level pinning of p metals on HfO2.

Fermi level pinning by defects in HfO2-metal gate stacks

We report on the development of a hafnium zirconate (HfZrO4) alloy gate dielectric for advanced gate stack applications. The HfZrO4 and hafnium dioxide (HfO2) films were formed by atomic layer deposition using metal halides and heavy water as precursors. The HfZrO4 material properties were examined and compared with those of HfO2 by a wide variety of analytical methods. The dielectric properties, device performance, and reliability of HfZrO4 were investigated by fabricating HfZrO4/tantalum carbide (TaxCy) metal-oxide-semiconductor field effect transistor. The HfZrO4 dielectric film has smaller band gap, smaller and more uniform grains, less charge traps, and more uniform film quality than HfO2. The HfZrO4 dielectric films exhibited good thermal stability with silicon. Compared to HfO2, the HfZrO4 gate dielectric showed lower capacitance equivalent thickness value, higher transconductance, less charge trapping, higher drive current, lower threshold voltage (Vt), reduced capacitance-voltage (C-V) hysteresis...

Hafnium zirconate gate dielectric for advanced gate stack applications

High-κ/metal gate technology is on the verge of replacing conventional oxynitride dielectrics in state-of-the-art transistors for both high-performance and low-power applications. In this review we discuss some of the key materials issues that complicated the introduction of high-κ dielectrics, including reduced electron mobility, oxygen-based thermal instabilities, and the absence of thermally stable dual-metal electrodes. We show that through a combination of materials innovations and engineering ingenuity these issues were successfully overcome, thereby paving the way for high-κ/metal gate implementation.

High-κ/Metal Gate Science and Technology

Integration challenges for metal gate electrodes including the presence of Fermi level pinning and the impact of interface chemistry on the effective metal work function are discussed Gate stack thermal instabilities are explored, and for the first time results using tantalum-carbon based electrodes are presented

Challenges for the integration of metal gate electrodes

The intent of this work is to investigate thermal stability, microstructure, and electrical properties of thin Hf6Ta2O17 high-k gate dielectrics. X-ray diffraction and transmission electron microscopy analysis reveal that an as-deposited Hf6Ta2O17 film is amorphous with a ∼1-nm interfacial layer. After a 1000 °C anneal, the film is a mixture of orthorhombic-Hf6Ta2O17 and monoclinic HfO2 with a thicker interfacial layer. Uniform Hf and Ta Auger depth profiles are observed for as deposited and annealed films. Secondary ion mass spectrometry (SIMS) analysis shows Hf and Ta profiles are unchanged following the 1000 °C anneal, indicating good thermal stability. There is, however, a clear indication of Si up-diffusion into Hf6Ta2O17, particularly after annealing at 1000 °C. No Hf or Ta is found in the Si substrate. Well-behaved capacitance-voltage curves and low leakage current characteristics were obtained for Mo/ Hf6Ta2O17 capacitors for as-deposited and 1000 °C annealed films. A flatband voltage (Vfb) shift towards negative voltage is observed for the annealed film when compared to the as-deposited film, indicating the presence of more positive charge, or less negative charge. Furthermore, capacitance-voltage stress measurements were performed to study charge trapping behaviors. A smaller Vfb shift is observed for as deposited (<10 mV) versus the 1000 °C annealed (30-40 mV) Hf6Ta2O17, indicating more charge trapping after the high temperature anneal.

https://www.cambridge.org/core/services/aop-cambridge-core/content/view/S0884291400026315

Thermal stability, microstructure, and electrical properties of atomic layer deposited Hf6Ta2O17 gate dielectrics

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Challenges for the integration of metal gate electrodes

Thermal stability, microstructure, and electrical properties of atomic layer deposited Hf6Ta2O17 gate dielectrics