K. Chen
1 Papers
K. Chen is an academic researcher. The author has contributed to research in topics: Dielectric & Gate dielectric. The author has co-authored 1 publications.
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Papers
Suppressed boron penetration in P/sup +/-poly PMOSFETs with NO-nitrided SiO/sub 2/ gate dielectrics
L. K. Han,D. Wristers,T.S. Chen,C. Lin,K. Chen,J. Fulford,Dim-Lee Kwong +6 more
- 31 May 1995
TL;DR: Ultrathin NO-nitrided SiO/sub 2/ has been demonstrated to be a promising gate dielectric for dual-gate CMOS to alleviate the boron penetration problem in BF/ sub 2/-implanted polysilicon gated p-MOSFETs.